Process monitoring apparatus and method for monitoring process

Abstract

A sensor on a semiconductor wafer is used as a process monitor and a capacitor is employed as a power supply for the sensor. The capacitor can be formed by stacking a poly-silicon layer and a silicon nitride layer on the wafer. A timer can be used to specify an operation time or an operation timing, etc. Furthermore, unauthorized use is prevented by storing a keyword in an ROM of the process monitor.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS [0001] This application is a division of U.S. patent application Ser. No. 10 / 532,991, filed Apr. 28, 2005, which is the National Phase of International Application PCT JP03 / 12555, filed Sep. 30, 2003, which claims priority to Japan Application No. 2002-318116, filed Oct. 21, 2002, the entire disclosures of which are incorporated herein by reference.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to a process monitor for monitoring a semiconductor manufacturing process, such as a plasma process, and to a semiconductor manufacturing apparatus having a process monitor. [0004] 2. Prior Art [0005] Conventionally, in a semiconductor manufacturing apparatus, a measurement of a plasma density or a temperature, etc., to optimally control a plasma process is carried out, for example, by inserting a plasma probe or a thermocouple into a plasma processing chamber at a time of development in a factory. Howe...

AI Technical Summary

Benefits of technology

The present invention provides a process monitor with a battery that is not deteriorated and free from contamination. The process monitor uses a capacitor as a power source, which can be charged and discharged repeatedly without losing its power. The capacitor is made of a poly-silicon layer and a silicon nitride layer, which are materials that do not contaminate the process chamber. The process monitor also has a memory to store measured data and a timer to set the operating time and period. It prevents unauthorized use by checking the keyword when reading data. The semiconductor manufacturing apparatus using the process monitor monitors the manufacturing process without contamination or decrease in operating rates and indicates appropriate maintenance for the apparatus.

Problems solved by technology

If, at each time, measuring by inserting a probe or the like is carried out, the measurement is very troublesome and a wiring, for measurement and control is necessary, which causes a disturbance in a measuring object.

A simultaneous multipoint measurement is difficult and measurement at an area where the measurement is actually required is also difficult.

Furthermore, a problem of contamination or a problem of decrease in operating rates, arises.

However, a battery, which is a power supply source for the wafer sensor, is deteriorated by repeated charging and discharging.

A material of which the battery is made could contaminate a plasma processing chamber if the sensor wafer is broken by an unexpected accident or the like.

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