Polishing slurry and polishing method using same

Abstract

Polishing slurry is caused to be present between a surface of a soft magnetic layer and a polishing tool such as a polishing pad and the surface of the soft magnetic layer and the polishing tool are moved relative to each other. The polishing slurry contains silica particles as abrading particles, compounds containing carboxylic acid and amino polycarboxylic acid and an oxidizing agent as a polishing accelerator, organic and/or inorganic compound of phosphoric acid, nitride and/or nitrite as an anti-corrosion agent and a pH conditioner such that the slurry has pH value between 4 and 11.

Description

[0001]This application claims priority on Japanese Patent Application 2006-256756 filed Sep. 22, 2006.BACKGROUND OF THE INVENTION[0002]This invention relates to polishing slurry for and a method of polishing the surface of a soft magnetic layer formed on the surface of a substrate for a perpendicular magnetic recording hard disk.[0003]Data processing devices for recording and reproducing data such as characters, images and sounds are coming to be incorporated not only into a personal computer but also into an electronic apparatus such as a television, a camera, a portable music player and a portable telephone. Such data processing devices are required to have a higher processing capability (or an increased recording capacity) and an improved accuracy in reproduction, as well as compactness.[0004]Data processing devices record and reproduce such data magnetically by means of a magnetic head on and from a magnetic recording medium. As magnetic recording media of this kind, perpendicul...

AI Technical Summary

Benefits of technology

[0019]A method of this invention for polishing the surface of a soft magnetic layer formed on the surface of a substrate for a perpendicular magnetic recording hard disk is characterized as comprising the steps of causing polishing slurry of this invention as described above to be present between the surface of the soft magnetic layer and a polishing tool which preferably comprises a polishing pad, and causing the surface of the soft magnetic layer and the pol

Problems solved by technology

From the point of view of mass production, the production cost would be too high if soft magnetic layers with such thickness were to be produced by sputte

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