Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Particle-Reducing Load Lock Seal

a technology of load lock and particle reduction, applied in the direction of mechanical conveyors, conveyors, thin material processing, etc., can solve the problems of large space occupation, linear tools, cluster tools, etc., and achieve the effect of convenient manufacturing methods, convenient vacuum sealing, and small footprin

Inactive Publication Date: 2008-06-05
BOOKS AUTOMATION US LLC
View PDF6 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The patent text describes methods and systems for improving semiconductor manufacturing handling and transport. The invention combines modular wafer transport and handling facilities in a flexible and efficient way. The use of a robotic arm and other similar devices allows for greater flexibility and functionality in the vacuum environment. The text also describes various improvements such as bypass thermal adjusters, buffering aligners, low particle vents, and more. The technical effects of the invention include increased flexibility, efficiency, and functionality in semiconductor manufacturing processes.

Problems solved by technology

Cluster tools, machines that arrange a group of semiconductor processing modules in a radius about a central robotic arm, take up a large amount of space, are relatively slow, and, by virtue of their architecture, are limited to a small number of semiconductor process modules, typically a maximum of about five or six.
Linear tools, while offering much greater flexibility and the potential for greater speed than cluster tools, do not fit well with the current infrastructure of most current semiconductor fabrication facilities.
Moreover, linear motion of equipment components within the typical vacuum environment of semiconductor manufacturing leads to problems in current linear systems, such as unacceptable levels of particles that are generated by friction among components.
As semiconductor manufacturing has grown in complexity, it becomes increasingly necessary to transfer wafers among a number of different process modules or clusters of process modules, and sometimes between tools and modules that are separated by significant distances.
This poses numerous difficulties, particularly when wafers are transferred between separate vacuum processing facilities.
Transfers between vacuum environments, or between a vacuum and other processing environments often results in increased risk of particle contamination (due to the pumping and venting of wafers in load locks) as well as higher thermal budgets where wafers are either heated or cooled during transfers.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Particle-Reducing Load Lock Seal
  • Particle-Reducing Load Lock Seal
  • Particle-Reducing Load Lock Seal

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0151]FIG. 1 shows equipment architectures 1000 for a variety of manufacturing equipment types. Each type of manufacturing equipment handles items, such as semiconductor wafers, between various processes, such as chemical vapor deposition processes, etching processes, and the like. As semiconductor manufacturing processes are typically extremely sensitive to contaminants, such as particulates and volatile organic compounds, the processes typically take place in a vacuum environment, in one or more process modules that are devoted to specific processes. Semiconductor wafers are moved by a handling system among the various processes to produce the end product, such as a chip. Various configurations 1000 exist for handling systems. A prevalent system is a cluster tool 1002, where process modules are positioned radially around a central handling system, such as a robotic arm. In other embodiments, a handling system can rotate items horizontally, such as in the embodiment 1004. An import...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Modular wafer transport and handling facilities are combined in a variety of ways deliver greater levels of flexibility, utility, efficiency, and functionality in a vacuum semiconductor processing system. Various processing and other modules may be interconnected with tunnel-and-cart transportation systems to extend the distance and versatility of the vacuum environment. Other improvements such as bypass thermal adjusters, buffering aligners, batch processing, multifunction modules, low particle vents, cluster processing cells, and the like are incorporated to expand functionality and improve processing efficiency.

Description

RELATED APPLICATIONS[0001]This application is a continuation of U.S. application Ser. No. 11 / 679,829 filed on Feb. 27, 2007.[0002]The '829 application is a continuation-in-part of U.S. application Ser. No. 10 / 985,834 filed on Nov. 10, 2004 which claims the benefit of U.S. Prov. App. No. 60 / 518,823 filed on Nov. 10, 2003 and U.S. Prov. App. No. 60 / 607,649 filed on Sep. 7, 2004.[0003]The '829 application also claims the benefit of U.S. Prov. App. No. 60 / 777,443 filed on Feb. 27, 2006; U.S. Prov. App. No. 60 / 779,684 filed on Mar. 5, 2006; U.S. Prov. App. No. 60 / 779,707 filed on Mar. 5, 2006; U.S. Prov. App. No. 60 / 779,478 filed on Mar. 5, 2006; U.S. Prov. App. No. 60 / 779,463 filed on Mar. 5, 2006; U.S. Prov. App. No. 60 / 779,609 filed on Mar. 5, 2006; U.S. Prov. App. No. 60 / 784,832 filed on Mar. 21, 2006; U.S. Prov. App. No. 60 / 746,163 filed on May 1, 2006; U.S. Prov. App. No. 60 / 807,189 filed on Jul. 12, 2006; and U.S. Prov. App. No. 60 / 823,454 filed on Aug. 24, 2006.[0004]Each of the ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(United States)
IPC IPC(8): H01L21/00
CPCB65G25/02B65G37/00H01L21/67161H01L21/67196H01L21/677H01L21/67745H01L21/67748H01L21/68792Y10S414/139H01L21/67742
Inventor VAN DER MEULEN, PETER
Owner BOOKS AUTOMATION US LLC
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products