Articles Comprising Nanoscale Patterns With Reduced Edge Roughness and Methods of Making Same
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a nanoscale pattern and edge roughness technology, applied in the field of articles comprising nanoscale patterns with reduced edge roughness and methods of making same, can solve the problems of affecting the performance of bio-analytical and microfluidic systems, and affecting the efficiency of nanoscale wires
Inactive Publication Date: 2008-09-25
PRINCETON UNIV
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Studies have shown that roughness causes scattering loss in optical devices, impedes electron transport through nanoscale wires and degrades performance in bio-analytic and micro-fluidic systems.
A variety of approaches have been proposed for the fabrication of smooth nanoscale surface patterned devices, but most are unsu...
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[0037]The following detailed description illustrates the invention by way of example and not by way of limitation. The description enables one skilled in the art to make and use the present disclosure, and describes several embodiments, adaptations, variations, alternatives, and uses of the present disclosure, including what is presently believed to be the best mode of carrying out the present disclosure.
[0038]The description is divided into four parts. Part I describes an exemplary article having a nanoscale pattern with smooth edges and / or sidewalls, and Parts II, III and IV describe approaches for making such articles.
[0039]I. Exemplary Article
[0040]Referring to the drawings, FIG. 20 is a schematic top view of an exemplary article 100 comprising a nanoscale patterned surface 101. Typical useful nanoscale surface patterns 101 are comprised of a plurality of protruding features 102 and one or more recessed features 103 having at least one protruding feature with a minimum lateral d...
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Abstract
In accordance with the invention, an article comprising a nanoscale surface pattern, such as a grating, is provided with a nanoscale patterns of reduced edge and/or sidewall roughness. Smooth featured articles, can be fabricated by nanoimprint lithography using a mold having sloped profile molding features. Another approach uses a mold especially fabricated to provide smooth sidewalls of reduced roughness, and a third approach adds a post-imprint smoothing step. These approaches can be utilized individually or in various combinations to make the novel articles.
Description
CROSS-REFERENCE TO RELATED APPLICATIONS[0001]The present application claims priority from, and is a division of, U.S. patent application Ser. No. 10 / 732,038 filed on Dec. 10, 2003, which in turn, is a continuation-in-part of U.S. patent application Ser. No. 10 / 046,594 filed on Oct. 29, 2001, which claims priority to U.S. patent application Ser. No. 09 / 107,006 filed on Jun. 30, 1998 (now U.S. Pat. No. 6,309,580 issued Oct. 30, 2001) and which, in turn, claims priority to U.S. patent application Ser. No. 08 / 558,809 filed on Nov. 15, 1995 (now U.S. Pat. No. 5,772,905 issued Jun. 30, 1998). The foregoing '038, '594, '006, and '809 applications are each incorporated herein by reference.[0002]The '038 Application further claims the benefit of U.S. Provisional Application Ser. No. 60 / 432,213 filed on Dec. 10, 2002 and also claims the benefit of U.S. Provisional Application Ser. No. 60 / 432,216 filed on Dec. 10, 2002. The foregoing '213 and '216 provisional applications are each incorporated...
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