Method and apparatus for depositing films

US20080311307A1Inactive Publication Date: 2008-12-18MASSACHUSETTS INST OF TECH

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  • Method and apparatus for depositing films
  • Method and apparatus for depositing films
  • Method and apparatus for depositing films

Examples

Experimental program
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Embodiment Construction

[0041]In one embodiment, the disclosure relates to a method and apparatus for depositing a film in substantially solid form on a substrate. Such films can be used, for example, in the design and construction of OLEDs and large area transistor circuits. In one embodiment, the disclosure relates to a method and apparatus for depositing a film of material in substantially solid form on a substrate. In another embodiment, the disclosure relates to a method and apparatus for depositing a film of material substantially free of solvent of a substrate. Such films can be used, for example, in the design and construction of OLEDs and large area transistor circuits. The materials that may be deposited by the apparatuses and methods described herein include organic materials, metal materials, and inorganic semiconductors and insulators, such as inorganic oxides, chalcogenides, Group IV semiconductors, Group III-V compound semiconductors, and Group II-VI semiconductors.

[0042]FIG. 1A is a schemat...

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Abstract

The disclosure relates to a method for depositing films on a substrate which may form part of an LED or other types of display. In one embodiment, the disclosure relates to an apparatus for depositing ink on a substrate. The apparatus includes a chamber for receiving ink; a discharge nozzle having an inlet port and an outlet port, the discharge nozzle receiving a quantity of ink from the chamber at the inlet port and dispensing the quantity of ink from the outlet port; and a dispenser for metering the quantity of ink from the chamber to the inlet port of the discharge nozzle; wherein the chamber receives ink in liquid form having a plurality of suspended particles and the quantity of ink is pulsatingly metered from the chamber to the discharge nozzle; and the discharge nozzle evaporates the carrier liquid and deposits the solid particles on the substrate.

Description

[0001]The instant application claims priority to Provisional Application No. 60 / 944,000 entitled “METHOD AND APPARATUS FOR DEPOSITING FILMS,” filed Jun. 14, 2007, which is incorporated herein by reference in its entirety.BACKGROUND[0002]1. Field of the Invention[0003]The disclosure relates to a method and apparatus for efficiently depositing patterns of films on a substrate. More specifically, the disclosure relates to a method and apparatus for depositing films on a substrate which may form part of an LED or other types of display.[0004]2. Description of Related Art[0005]The manufacture of organic light emitting devices (OLEDs) requires depositing one or more organic films on a substrate and coupling the top and bottom of the film stack to electrodes. The film thickness is a prime consideration. The total layer stack thickness is about 100 nm and each layer is optimally deposited uniformly with an accuracy of better than ±1 nm. Film purity is also important. Conventional apparatuse...

Claims

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Application Information

Patent Timeline
18 Dec 2008
Publication
US20080311307A1
IPC
B05D1/32; B41J2/14
CPC
B05B17/0638; B41J2/14; B41J2202/09; B41J2202/16; B41J2/04588; H01L51/56; B41J2/07; H05B33/10
Inventors
BULOVIC, VLADIMIR; CHEN, JIANGLONG