Burnishing tape and method of manufacturing the same, and method of burnishing magnetic disk
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[0124]An Example for demonstrating the invention will be given below for illustrative purposes only. The invention is not limited to the Example.
Fabrication of Magnetic Disk
[0125]A washed glass substrate (manufactured by HOYA Corporation, 2.5 inches in outer diameter) is placed in a film forming chamber of a DC magnetron sputtering apparatus (C-3010 manufactured by Canon ANELVA Corporation). A vacuum is formed in film forming chamber so that the ultimate vacuum becomes 1×10−5 Pa. On this glass substrate, a target of 89Co-4Zr-7Nb (Co content 89 at %, Zr content 4 at % and Nb content 7 at %) is used to form a 100-nm-thick underlayer by sputtering at the substrate temperature of 100° C. or less.
[0126]The glass substrate is then heated to 200° C., and a 5-nm-thick intermediate layer is formed on the underlayer using a 65Co-30Cr-5B target. Then, a 25-nm-thick magnetic layer is formed using a 61Co-20Cr-17Pt-2B target. In this sputtering process, a layer is formed using argon as the proces...
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