Shear-Layer Chuck for Lithographic Apparatus
a chuck and lithographic technology, applied in the field of lithographic apparatus, can solve the problems of chuck as well as the object deformation, uniform transfer of acceleration-induced stress from the stage to the chuck (as well as from the chuck to the object), and the potential for slippage between the chuck and the object, so as to achieve the effect of minimizing the slippage of a supported obj
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[0032]This specification discloses one or more embodiments that incorporate the features of this invention. The disclosed embodiment(s) merely exemplify the invention. The scope of the invention is not limited to the disclosed embodiment(s). The invention is defined by the claims appended hereto.
[0033]The embodiment(s) described, and references in the specification to “one embodiment”, “an embodiment”, “an example embodiment”, etc., indicate that the embodiment(s) described can include a particular feature, structure, or characteristic, but every embodiment cannot necessarily include the particular feature, structure, or characteristic. Moreover, such phrases are not necessarily referring to the same embodiment. Further, when a particular feature, structure, or characteristic is described in connection with an embodiment, it is understood that it is within the knowledge of one skilled in the art to effect such feature, structure, or characteristic in connection with other embodiment...
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