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Methods and apparatus for aligning an etalon with a photodiode array

a technology of photodiode array and etalon, which is applied in the direction of interferometric spectrometry, optical radiation measurement, instruments, etc., can solve the problems of affecting the accuracy of the wavemeter, and requiring physical access to the internal wavemeter components. , the cost and time-consuming of alignment inspection techniques

Inactive Publication Date: 2008-08-12
CYMER INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

This approach allows for efficient and non-invasive alignment and monitoring of the etalon and photodiode array, ensuring precise control over wavelength and bandwidth, thereby maintaining consistent laser performance without the need for physical access to internal components.

Problems solved by technology

This creates an optical cavity, in which constructive and destructive interference of light passing through the cavity can occur.
The initial alignment may, for example, be altered during shipment or installation of the laser, adversely affecting the precision of the wavemeter.
Thus, alignment inspections techniques that require physical access to the internal wavemeter components can be expensive and time-consuming.

Method used

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  • Methods and apparatus for aligning an etalon with a photodiode array
  • Methods and apparatus for aligning an etalon with a photodiode array
  • Methods and apparatus for aligning an etalon with a photodiode array

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Embodiment Construction

[0016]Referring initially to FIG. 1, an apparatus is shown and generally designated 10 for measuring a characteristic, e.g. spectral bandwidth and / or center wavelength, of a light beam 12. As shown, the apparatus 10 includes an etalon assembly 14 positioned on the beam path of the light beam 12 and an arrangement of detector elements, which can be for example a PDA 16, and an auxiliary alignment photodiode 18.

[0017]In more detail, the etalon assembly 14 may include an etalon housing 20 having an optical input window 22 and exit window 24. Two flat etalon plates 26a,b may be spaced apart and rigidly mounted, e.g. bonded using RTV adhesive, to the housing 20 to create an etalon cavity 28 between the plates. For the etalon assembly 14, surface 30 of plate 26a and surface 32 of plate 26b are typically coated with an anti-reflection coating and surface 34 of plate 26a and surface 36 of plate 26b are typically coated with a highly reflective coating. More details regarding suitable plate ...

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PUM

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Abstract

A method and apparatus are disclosed for measuring a characteristic, e.g. spectral bandwidth, of a light beam. The apparatus may comprise an etalon for generating an interference pattern having at least one light cone, an arrangement of detector elements, the arrangement receiving a portion of the light cone and producing a signal indicative of the characteristic; and an auxiliary detector positioned to receive a portion of the light cone and produce a signal indicative of an alignment between the etalon and the linear arrangement.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS[0001]The present application is related to co-pending U.S. patent applications Ser. No. 11 / 260,929, entitled BLISTER RESISTANT OPTICAL COATING, filed on Oct. 27, 2005; co-pending U.S. patent applications Ser. No. 09 / 931,726, entitled CONVOLUTION METHOD FOR MEASURING LASER BANDWIDTH, filed on Aug. 16, 2001; Ser. No. 10 / 609,223, entitled METHOD AND APPARATUS FOR MEASURING BANDWIDTH OF AN OPTICAL OUTPUT OF A LASER, filed on Jun. 26, 2003; Ser. No. 10 / 789,328, entitled IMPROVED BANDWIDTH ESTIMATION, filed on Feb. 27, 2004; Ser. No. 11 / 091,005, entitled WAVEMETER FOR GAS DISCHARGE LASER, filed on Mar. 25, 2005; and U.S. Pat. No. 6,952,267, entitled METHOD AND APPARATUS FOR MEASURING BANDWIDTH OF A LASER OUTPUT, issued on Oct. 4, 2005; U.S. Pat. No. 6,912,052, entitled GAS DISCHARGE MOPA LASER SPECTRAL ANALYSIS MODULE, issued on Jun. 28, 2005; U.S. Pat. No. 6,894,785, entitled GAS DISCHARGE MOPA LASER SPECTRAL ANALYSIS MODULE, issued on May 17, 2005...

Claims

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Application Information

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Patent Type & Authority Patents(United States)
IPC IPC(8): G01B9/02G01J3/45
CPCG01J3/02G01J3/26G01J3/0289G01J3/027
Inventor RAFAC, ROBERT J.
Owner CYMER INC