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Back incident type quartz reflective polarizing beam split grating of 632.8 nano wave length

A reflection polarization, beam splitting grating technology, applied in directions such as diffraction gratings

Inactive Publication Date: 2007-10-03
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But as far as we know, no one has given the design parameters of the immersed high-density quartz reflective polarization beam-splitting grating for the commonly used He-Ne laser 632.8 nm wavelength

Method used

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  • Back incident type quartz reflective polarizing beam split grating of 632.8 nano wave length
  • Back incident type quartz reflective polarizing beam split grating of 632.8 nano wave length
  • Back incident type quartz reflective polarizing beam split grating of 632.8 nano wave length

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Embodiment Construction

[0020] Using micro-optical technology to manufacture high-density rectangular polarization beam-splitting gratings, first deposit a layer of metal chromium film on a dry and clean fused silica substrate, and evenly coat a layer of positive photoresist on the chromium film (Shipley, S1818, USA ). Then the grating is recorded in a holographic recording manner, see FIG. 6 , and a He-Cd laser 7 (wavelength of 0.441 μm) is used as the recording light source. When recording the holographic grating, the shutter 8 is opened, and the narrow beam emitted from the laser is divided into two narrow beams by the beam splitter 9. After one beam passes through the mirror 10, it passes through the beam expander 14 and the lens 16 to form a wide plane wave; after the other beam passes through the mirror 11, it passes through the beam expander 15 and the lens 17 to form a wide plane wave. After the two beams of plane waves pass through the mirrors 12 and 13 respectively, they form an interferen...

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Abstract

This invention relates to a back incidence quartz reflection polarized light splitting grating, in which, when the period of said grating is 281-286nm, the etched depth is 0.800-0.810mum, the duty ratio is 1 / 2, the extinction ratio is greater than 100, the reflection diffraction efficiency of TE at the 0 stage and that of TM at 1 stage are higher than 99.09% and 99.73%, especially when the grating period is 283nm and the etched depth is 0.805mum, the extinction ratio reaches to 2.07x10< 4 >, the reflection diffraction efficiencies of TE and TM approach to 1. The extinction ratio of said grating at the sphere of 628-637nm wave length is greater than 100, the reflection diffraction efficiency of TE at 0 stage and that of TM at 1 stage are higher than 99.13% and 99.73% separately, the extinction ratio is greater than 100 when the angle bandwidth is 49.22deg.-51.02deg., the reflection diffraction efficiencies of them are higher than 99.99% and 99.00%.

Description

technical field [0001] This patent relates to a polarization beam-splitting grating, in particular to a back-incidence (or immersion) quartz reflective polarization beam-splitting grating of a He-Ne laser with a wavelength of 632.8 nanometers. Background technique [0002] In many optical information processing systems, a polarizing beam splitter is a key component that splits light into two beams whose polarization modes are perpendicular to each other. In most applications, a polarizing beam splitter with high extinction ratio, high transmittance or reflectance, wide operable wavelength range and angular bandwidth, and small size is often required. Traditional polarizing beam splitters are based on the natural birefringence effect of some crystals (such as Thomson prisms, Nicol prisms, and Wollaston prisms) or the polarization selectivity of multilayer dielectric films. However, polarizing beam splitters made of birefringent crystals are bulky and expensive; while thin-fi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18
Inventor 周常河王博
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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