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Back incident type quartz reflective polarizing beam split grating of 632.8 nano wave length

A reflective polarization, beam splitting grating technology, applied in the direction of diffraction grating

Inactive Publication Date: 2006-08-23
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But as far as we know, no one has given the design parameters of the immersed high-density quartz reflective polarization beam-splitting grating for the commonly used He-Ne laser 632.8 nm wavelength

Method used

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  • Back incident type quartz reflective polarizing beam split grating of 632.8 nano wave length
  • Back incident type quartz reflective polarizing beam split grating of 632.8 nano wave length
  • Back incident type quartz reflective polarizing beam split grating of 632.8 nano wave length

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Embodiment Construction

[0020] A high-density rectangular polarizing beam splitter grating is fabricated by micro-optic technology. First, a metal chromium film is deposited on a dry and clean fused silica substrate, and a layer of positive photoresist is uniformly coated on the chromium film (Shipley, S1818, USA ). The grating is then recorded using a holographic recording method, see Image 6 , using He-Cd laser 7 (wavelength 0.441 μm) as the recording light source. When recording the holographic grating, the shutter 8 is opened, and the narrow beam emitted from the laser is divided into two narrow beams by the beam splitter 9 . After one beam passes through the reflector 10 , it passes through the beam expander 14 and the lens 16 to form a wide plane wave; after the other beam passes through the reflector 11 , it forms a wide plane wave through the beam expander 15 and the lens 17 . After the two beams of plane waves pass through the mirrors 12 and 13 respectively, they form an interference fiel...

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Abstract

This invention relates to a back incidence quartz reflection polarized light splitting grating, in which, when the period of said grating is 281-286nm, the etched depth is 0.800-0.810mum, the duty ratio is 1 / 2, the extinction ratio is greater than 100, the reflection diffraction efficiency of TE at the 0 stage and that of TM at 1 stage are higher than 99.09% and 99.73%, especially when the grating period is 283nm and the etched depth is 0.805mum, the extinction ratio reaches to 2.07x10< 4 >, the reflection diffraction efficiencies of TE and TM approach to 1. The extinction ratio of said grating at the sphere of 628-637nm wave length is greater than 100, the reflection diffraction efficiency of TE at 0 stage and that of TM at 1 stage are higher than 99.13% and 99.73% separately, the extinction ratio is greater than 100 when the angle bandwidth is 49.22deg.-51.02deg., the reflection diffraction efficiencies of them are higher than 99.99% and 99.00%.

Description

technical field [0001] This patent relates to a polarization beam splitter grating, in particular to a back-incidence (or immersion) quartz reflective polarization beam splitter grating of He-Ne laser with a wavelength of 632.8 nm. Background technique [0002] In many optical information processing systems, a polarizing beam splitter is a key component, which can split light into two beams of polarized light whose polarization modes are perpendicular to each other. In most applications, polarizing beamsplitters with high extinction ratio, high transmittance or reflectivity, wide operable wavelength range and angular bandwidth, and small size are required. Conventional polarizing beam splitters are based on the natural birefringence effect of some crystals (eg Thomson prisms, Nicol prisms and Wollaston prisms) or the polarization selectivity of multilayer dielectric films. However, the polarizing beam splitter made of birefringent crystals is bulky and expensive; while the ...

Claims

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Application Information

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IPC IPC(8): G02B5/18
Inventor 周常河王博
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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