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1550 nanometer wavelength silicon reflection type polarized beam splitting optical grating

A polarization beam splitting, reflective technology, applied in diffraction gratings, polarizing elements, optics, etc.

Inactive Publication Date: 2008-01-23
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But as far as we know, so far, no one has given the design parameters of high-density deep-etched silicon reflective polarization beam-splitting grating for infrared light with a wavelength of 1550 nm.

Method used

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  • 1550 nanometer wavelength silicon reflection type polarized beam splitting optical grating
  • 1550 nanometer wavelength silicon reflection type polarized beam splitting optical grating
  • 1550 nanometer wavelength silicon reflection type polarized beam splitting optical grating

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Embodiment Construction

[0023]Using micro-optical technology to fabricate high-density rectangular polarization beam-splitting gratings, first deposit a layer of metal chromium film on a dry and clean silicon substrate, and evenly coat a layer of positive photoresist on the chromium film (Shipley, S1818, USA) . Then use the holographic recording method to record the grating (see Figure 7), using He-Cd laser 7 (wavelength 441 nm) as the recording light source. When recording the holographic grating, the shutter 8 is opened, and the narrow beam emitted from the laser is divided into two narrow beams by the beam splitter 9. After one beam passes through the mirror 10, it passes through the beam expander 14 and the lens 16 to form a wide plane wave; after the other beam passes through the mirror 11, it passes through the beam expander 15 and the lens 17 to form a wide plane wave. After the two beams of plane waves pass through the mirrors 12 and 13 respectively, they form an interference field on the su...

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Abstract

The invention provides a 1550nm wavelength silicon reflective polarization beam splitting raster. When the TM polarized light and TE polarized light are reflected respectively at level 0 and 1, the duty ratio of the raster is 0.5, the cycle of the raster is 344-412 nm, and the erosion depth is 1.076-1.205 micrometer, the extinction ratio of the polarization beam splitting raster is more than 100, and two lights with polarization modes vertical to each other can be divided to emit at different directions.

Description

technical field [0001] The invention relates to a polarization beam splitting grating, in particular to a silicon reflective polarization beam splitting grating with a wavelength of 1550 nanometers. Background technique [0002] In the field of optical communication, a polarization beam splitter is a key optical component, which can split light into two beams of polarized light whose polarization directions are perpendicular to each other. In most applications, people often need a polarization beam splitter with high extinction ratio, high diffraction efficiency, wide operable wavelength range and angular bandwidth, and small size. Traditional polarizing beam splitters are based on the natural birefringence effect of some crystals (such as Thomson prisms, Nicol prisms, and Wollaston prisms) or the polarization selectivity of multilayer dielectric films. However, polarizing beam splitters made of birefringent crystals are bulky and expensive; while thin-film polarizing beam ...

Claims

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Application Information

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IPC IPC(8): G02B5/18G02B27/28G02B5/30
Inventor 周常河冯吉军王博茹华一
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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