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Correction method of evenness of film thickness of electron beam evaporation film coating

A technology of electron beam evaporation and uniform film thickness, which is applied in vacuum evaporation plating, ion implantation plating, sputtering plating, etc., can solve the problems of increasing labor and cost, and not really grasping the uniformity, so as to improve Effect of Thickness Uniformity

Inactive Publication Date: 2008-01-23
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

[0004] The traditional correction of thickness uniformity of optical film is generally done by using baffles through repeated experiments. In the same cover, the thicker part of the optical film is more blocked, and the thinner part is less blocked or even not blocked. However, this method has many problems. Large contingency requires repeated experiments and constant trimming of the baffle to solve the uniformity of the film thickness. It can be seen that this method of correcting the uniformity does not really grasp the essence of the uniformity problem, which greatly increases the labor to solve the problem. volume and cost

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  • Correction method of evenness of film thickness of electron beam evaporation film coating
  • Correction method of evenness of film thickness of electron beam evaporation film coating
  • Correction method of evenness of film thickness of electron beam evaporation film coating

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Embodiment Construction

[0037] The present invention will be further described below in conjunction with the embodiments and accompanying drawings.

[0038] The basis of the program of the present invention is as follows:

[0039] Thickness uniformity is a common problem in the production of optical films. There are many factors that affect the thickness uniformity of optical films, but in general it can be attributed to two aspects:

[0040] 1. The geometric configuration of the vacuum chamber, such as the distance of the electron beam evaporation source from the central axis of the vacuum chamber, the height of the fixture, the shape of the fixture and other system factors.

[0041] 2. The evaporation characteristics of the evaporation source are related to factors such as the type of material, the evaporation parameters during coating, and the way the operator operates the electron beam evaporation source.

[0042] In theory, evaporation sources can be divided into two categories: point evaporati...

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Abstract

A method for correcting the thickness uniformity of the film plated by electronic beam evaporation, that is, designing the correcting barrier includes such steps as writing the expression equations of r, cos theta and cos phi according to actual configuration of vacuum chamber, drawing the theoretical distribution curves of film thickness, determining the evaporation characteristics of actual film material by experiments, determining the position of barrier, and desighing the shape of correcting barrier.

Description

technical field [0001] The invention relates to an optical thin film, in particular to a method for correcting the thickness uniformity of an electron beam evaporation coating film. Background technique [0002] As an important part of modern science and technology, optical thin film technology covers all aspects of people's lives and greatly improves and enhances people's lives. Optical thin film components endow optical components with various performances, which play an important and even decisive role in the quality of optical instruments. The status and role of optical thin film technology in the field of optics cannot be replaced by any other technology. Optical thin films are widely used in people's daily life, industry, agriculture, construction, transportation, medicine, astronomy, military and aerospace and other broad fields. The role of optical films can be summed up in one sentence: wherever there is light, there will be shadows of optical films. [0003] As ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/30C23C14/54G02B1/10
Inventor 毕军易葵黄建兵王素梅傅小勇沈健朱美萍范正修
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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