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Nozzle assembly for applying a liquid to a substrate

A nozzle device, nozzle technology, applied in the direction of the surface coating liquid device, spray device, spray device, etc., to achieve the effect of ensuring the flow speed

Inactive Publication Date: 2009-04-08
聚斯微技术光掩膜设备有限责任两合公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, it will cause the formation of the above-mentioned single nozzle pattern

Method used

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  • Nozzle assembly for applying a liquid to a substrate
  • Nozzle assembly for applying a liquid to a substrate
  • Nozzle assembly for applying a liquid to a substrate

Examples

Experimental program
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Embodiment Construction

[0034] figure 1 A schematic top view of an apparatus 1 for processing photolithographic masks 2 for the manufacture of semiconductor wafers is shown. The device 1 has a treatment vessel 4 with a side wall 5 which tapers conically at least in an upper region 7 to form an upper circular inlet / outlet opening 8 . The bottom of the treatment container 4 is formed by a corresponding floor, which is fastened together with the side wall panels 5 on a fastening plate 10 . The upper inlet / outlet opening 8 can be closed by a corresponding cover, not shown in detail. In the conical part 7 of the side wall 5 a number of through-holes 12 are provided for the passage of different treatment systems, in particular feed lines for different liquids.

[0035] Inside the processing container 4 is provided with a rotatable receiving device 15, the device according to figure 1 Four support elements 17 are shown. The receiving device 15 is rotatable by means of a shaft passing through the contain...

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Abstract

The aim of the invention is to achieve a rapid, homogeneous application of a liquid with as little force as possible to a substrate. To achieve this, the invention provides a nozzle assembly (22) for applying a liquid to a substrate, said assembly having a nozzle body (26) comprising a plurality of nozzles (36) that are substantially arranged in a line and a guide plate (28) that extends essentially in a vertical direction with a straight lower edge. According to the invention, the nozzles (36) above the lower edge are directed towards the guide plate (28) in such a way that a film of liquid forms on the guide plate (28) and flows over the lower edge (64).

Description

technical field [0001] The present invention relates to a nozzle arrangement for applying a liquid to a substrate. Background technique [0002] In many applications, especially in the manufacture of wafers and photolithographic masks, it is necessary to apply a liquid layer on a wafer or a mask, for example as a revealing agent, for processing the substrate. [0003] This has historically been accomplished with a single nozzle directed at the substrate, which is scanned or swept across the mask or wafer in a grid-like manner to wet the entire substrate surface. Another solution that has been considered is the use of a plurality of nozzles arranged next to one another, which are directed at the substrate surface and wet the entire substrate within a single scanning process. [0004] If the liquid to be applied is, for example, a developing liquid, which is used in microlithographic development processes, it is important for the quality of the final product that the The sam...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03D5/04B05C5/00G03F7/30B05B1/14H01L21/027
CPCB05C5/005G03F7/16G03D5/04B05D1/04
Inventor A·施维尔森茨W·索勒A·内林P·德雷斯C·伯格尔M·钦克尔M·施特罗布尔
Owner 聚斯微技术光掩膜设备有限责任两合公司
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