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Image sensor and image sensor module

An image sensor and transfer transistor technology, applied in the field of CMOS image sensors, can solve the problem of slowing down the signal voltage reading action speed, achieve the effects of suppressing gate leakage current, suppressing noise, and reducing power consumption

Inactive Publication Date: 2009-04-08
FUJITSU SEMICON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since the pocket region is formed in the high-concentration impurity region with the same polarity as the substrate, the depletion layer formed on the junction of the source / drain region and the pocket region further increases the junction capacitance, and a readout of the signal voltage occurs. Take the problem that the action speed is further reduced

Method used

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  • Image sensor and image sensor module
  • Image sensor and image sensor module
  • Image sensor and image sensor module

Examples

Experimental program
Comparison scheme
Effect test

no. 1 Embodiment

[0057] This embodiment is an example of a CMOS image sensor in which the gate insulating film of the reset transistor and the detecting transistor in the pixel unit is formed thicker than the insulating film of the selection transistor and transistors of the peripheral circuit.

[0058] FIG. 6 is a cross-sectional view showing the CMOS image sensor of this embodiment. 6 shows elements in the pixel unit 14 and some elements of the peripheral circuit 12 and the input / output circuit 13 . In addition, the cross-sectional view of the pixel unit 14 in FIG. Figure 5 Active region 25 is shown cut away.

[0059] Referring to FIG. 6 , the CMOS image sensor is composed of a photosensor 31 , a pixel unit 14 composed of three n-channel MOS transistors 32 to 34 , a peripheral circuit 12 composed of MOS transistors, and an input / output circuit 13 . The three n-channel MOS transistors 32 to 34 in the pixel unit 14 are a reset transistor 32 , a detection transistor 33 , and a selection tran...

no. 2 Embodiment

[0094] This embodiment is an example of a CMOS image sensor in which the gate insulating films of the detection transistors, reset transistors, and selection transistors in the pixel unit are formed thicker than the gate insulating films of transistors in peripheral circuits.

[0095] FIG. 9 is a diagram showing a cross-sectional view of the CMOS image sensor of this embodiment. FIG. 9 shows elements in the pixel unit 14 and some elements of the peripheral circuit 12 and the input / output circuit 13 . Hereinafter, in the drawings, the same reference numerals are assigned to the parts corresponding to the parts described above, and the description thereof will be omitted.

[0096] Referring to FIG. 9, a CMOS image sensor 100 is composed of a pixel unit 14 composed of a photodiode 31 and three n-channel MOS transistors 32-34, a peripheral circuit 12 composed of MOS transistors 35, 36, and an input / output circuit 13. . Among them, the special feature is that a thick gate insulat...

no. 3 Embodiment

[0107] This embodiment is an example of a CMOS image sensor in which the gate insulating film of the reset transistor in the pixel unit is formed thicker than the gate insulating film of the detection transistor, the selection transistor, and the transistors of the peripheral circuit.

[0108] FIG. 11 is a diagram showing a cross-sectional view of a CMOS image sensor 110 of this embodiment. FIG. 11 shows elements in the pixel unit 14 , and some elements of the peripheral circuit 12 and the input / output circuit 13 . Hereinafter, in the drawings, the same reference numerals are assigned to the parts corresponding to the parts described earlier, and the description thereof will be omitted.

[0109] Referring to FIG. 11 , the CMOS transistor 110 is composed of a pixel unit 14 composed of a photodiode 31 and three n-channel MOS transistors, a peripheral circuit 12 composed of MOS transistors, and an input / output circuit 13 . Among them, the special feature is that a thick gate ins...

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Abstract

An image sensor is provided that can be made compact, low power consuming, and operative at high speed without degrading image quality and read-out speed. The image sensor includes a pixel cell having a photo diode 31 and a reset transistor 32 connected to a power supply, a detection transistor 33 for detecting the signal voltage of the photo diode 31, a selection transistor 34 for selecting the detection transistor 33 and reading the signal voltage therefrom; a peripheral circuit 12 having MOS transistors; and an input / output circuit 13 having MOS transistors. The gate dielectric films 60A of the reset transistor 32 and the detection transistor 33 are formed thicker than the gate dielectric film of the selection transistor 34.

Description

technical field [0001] The present invention relates to a semiconductor device and a method of manufacturing the same, and more particularly to a CMOS image sensor capable of miniaturization and high performance. [0002] As the solid-state imaging element, a CCD image sensor and a CMOS image sensor are used. The CCD image sensor has the characteristics of high sensitivity and high image quality. On the other hand, the CMOS image sensor can be driven by a single power supply, and the power consumption is 1 / 10 of that of the CCD image sensor. In recent years, there has been a tendency to apply this characteristic of CMOS image sensors to mobile phones and portable terminals. Background technique [0003] The CMOS image sensor has the advantage that it can be formed on the same semiconductor substrate as the imaging unit and signal processing circuit, and can be manufactured in the same manufacturing process as a semiconductor integrated circuit such as a system LSI. [000...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/14H01L27/088H01L21/8234H01L27/146
CPCH01L27/14634H01L27/14689H01L27/1469H01L27/14614H01L27/14609H01L21/823462H01L27/14612H01L27/14601H01L27/14618H01L2924/0002H01L2924/00H01L27/146
Inventor 大川成实
Owner FUJITSU SEMICON LTD