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Lithographic apparatus and device manufacturing method

A lithography and light beam technology, which is applied in semiconductor/solid-state device manufacturing, photolithography exposure equipment, microlithography exposure equipment, etc., can solve the problems of difficult positioning of air shower system, insufficient, large projection system, etc.

Active Publication Date: 2009-06-10
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] however, the aforementioned development of bulky projection systems and close working distances made it difficult to position the air shower system in such a way as to adequately reach the entire area
In particular, due to the small working distance and the large projection system, there is practically not enough room to place the air shower system in such a way that the airflow can adequately accommodate the volume below the lower plane of the robot and above the wafer stage

Method used

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  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method
  • Lithographic apparatus and device manufacturing method

Examples

Experimental program
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Embodiment Construction

[0032] figure 1 A lithographic apparatus according to a particular embodiment of the invention is schematically shown. The unit includes:

[0033] - an illumination system (illuminator) IL for providing a projection beam PB of radiation, such as UV radiation or EUV radiation;

[0034] - a first support structure (eg mask table) MT for supporting the patterning device (eg mask) MA, connected to first positioning means PM for precise positioning of the patterning device relative to the object PL;

[0035] - a substrate table (e.g. a wafer table) WT for holding a substrate (e.g. a resist-coated wafer) W connected to a second positioning device PW for precise positioning of the substrate relative to the object PL; and

[0036] - A projection system (eg reflective projection lens) PL for imaging the pattern applied to the projection beam PB by the patterning device MA on a target portion C of the substrate W (eg comprising one or more dies).

[0037] As described herein, the de...

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Abstract

A lithographic apparatus comprising: a radiation system providing a radiation projection beam; a first support structure supporting a patterning device for patterning the projection beam according to a desired pattern; a second support supporting a substrate structure; a projection system for projecting a patterned light beam onto a target portion of a substrate, the projection system comprising a lower surface defining a working distance to the substrate; and at least one gas generating structure between said lower surface and the substrate A conditioned airflow is generated in a volume extending therebetween, wherein the gas generating structure further includes a guide for directing the airflow into an underlying volume positioned substantially below the lower surface of the projection system, the guide being configured to direct The airflow is directed from a generally downward direction to a direction generally parallel to the lower surface of the projection system. Wherein the guide is a deflection panel arranged to deflect the airflow towards the volume below. The invention also provides a device manufacturing method.

Description

technical field [0001] The invention relates to a photolithography device. Background technique [0002] A lithographic apparatus is a machine that can apply a desired pattern on a target portion of a substrate. A lithographic apparatus may be used, for example, in the manufacture of integrated circuits (ICs). In this case, a patterning device such as a mask can be used to create a circuit pattern corresponding to the individual layers of the IC that can be imaged onto a substrate (such as silicon) with a layer of radiation-sensitive material (resist). on a target portion (eg, including one or more dies) on a wafer). Typically, a single substrate contains a network of adjacent target portions that are sequentially exposed. Known lithographic apparatuses include so-called steppers, in which each target portion is irradiated by exposing the entire pattern on the target portion at once, and so-called scanners, in which light is irradiated in a given direction (“scanning” dir...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027
Inventor N·A·拉勒曼特M·C·M·维哈根M·贝克斯R·斯图蒂恩斯P·A·斯米特斯W·F·G·M·赫托格D·T·W·范德普拉斯S·科伊林克H·克雷斯
Owner ASML NETHERLANDS BV