Vacuum ripple sorption pipe used for chemical gaseous phase deposition device
A chemical vapor deposition, bellows technology, applied in gaseous chemical plating, metal material coating process, coating and other directions, can solve the problem of no precision specification requirements, position deviation, vacuum leakage on the contact surface, and improve the connection. effect, the effect of reducing the incidence of abnormality and improving the utilization rate
Inactive Publication Date: 2009-06-17
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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Problems solved by technology
[0002] Present chemical vapor deposition device, such as APT-5850, the vacuum adsorption tube that uses is all one-piece metal tube, and it exists following deficiencies: 1) because, the fixed part in the vacuum adsorption tube contacts with the silicon wafer sucker The connection part is designed in one piece, so when the connection part between the front section and the silicon wafer sucker is damaged, the whole part must be replaced, so it is easy to cause a lot of waste. According to the survey, the current market price of this part is 1250 US dollars
2) Since the contact area between the vacuum suction tube and the silicon wafer sucker is 20mm 2 At the same time, there is no precision specification requirement for its contact surface, so it is easy to shift the position when the equipment turntable rotates, resulting in vacuum leakage and other bad situations
4) The spring corrugation has 15 teeth, so the degree of freedom of fixing is small. When the force is uneven and the position is shifted, due to the small number of spring corrugations, the corrugated vacuum suction tube cannot fully contact the silicon wafer suction cup. It is easy to cause the phenomenon of vacuum leakage
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[0016] Such as figure 1 Shown is an exemplary structure diagram of the vacuum corrugated suction tube of the present invention. This vacuum bellows comprises following five parts: spring bellows 11, the teeth number of its spring corrugation can be taken between 35 teeth to 45 teeth, can be used for increasing the fixed degree of freedom between the vacuum suction tube and the silicon chip suction cup, when producing relatively When there is a large position deviation, the vacuum corrugated suction tube can still be in full contact with the silicon wafer sucker, and there will be no vacuum leakage; the selection of the inner and outer diameters and lengths of the spring bellows 11 depends on the size of the chemical vapor deposition device Assembling requirements, this example is for APT-5850, whose outer diameters are Φ5.0mm and Φ10.5mm respectively, the length is 20mm, the shrinkage is 4.0mm, and the material used is approximately AM350; the two connecting parts 12, the mate...
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Abstract
The invention discloses a vacuum corrugated absorption tube used for chemical vapor deposition apparatus, which comprises the following five portions: a spring corrugated tube with a thread number of 35-45, two connectors respectively positioned at the front and rear ends of the spring corrugated tube, a corrugated tube posterior step with a surface treatment accuracy less than 0.8micron2Ra, a corrugated tube anterior step with a surface treatment accuracy less than 0.8micron2Ra and an outer diameter sufficient to the interference fit with a vacuum pipeline of a silicon wafer sucker, and an elongated tube capable of inserting into the vacuum pipeline of the silicon wafer sucker. The five portions are welded together without gaps. The vacuum corrugated absorption tube has large contact area with the silicon wafer sucker, reduces the abnormal rate of failure to adsorb silicon wafer, and avoids the economic waste.
Description
technical field [0001] The invention relates to a vacuum corrugated suction tube, in particular to a vacuum corrugated suction tube used in a chemical vapor deposition device. Background technique [0002] Present chemical vapor deposition device, such as APT-5850, the vacuum adsorption tube that uses is all one-piece metal tube, and it exists following deficiencies: 1) because, the fixed part in the vacuum adsorption tube contacts with the silicon wafer sucker The connection part is designed in one piece, so when the connection part between the front section and the silicon wafer suction cup is damaged, the whole part must be replaced, so it is easy to cause a lot of waste. According to the survey, the current market price of this part is 1250 US dollars. 2) Since the contact area between the vacuum suction tube and the silicon wafer sucker is 20mm 2 At the same time, there is no precision specification requirement for its contact surface, so it is easy to shift the positi...
Claims
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IPC IPC(8): C23C16/00
Inventor 王霞珑陈奕弢
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP