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Substrate treater

A technology for processing devices and substrates, which is applied to components of pumping devices for elastic fluids, non-variable-capacity pumps, electrical components, etc. Effect

Active Publication Date: 2009-07-15
SHIBAURA MECHATRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The misty processing liquid floating in the chamber will adhere to the processed substrate and become the cause of contamination of the substrate
In particular, if the mist-like processing liquid adheres to the cleaned substrate, it will cause quality degradation and produce defective products, so it is not ideal.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] Hereinafter, one embodiment of the present invention will be described with reference to the drawings.

[0023] figure 1 It is a perspective view showing the schematic structure of the processing apparatus of this invention, This processing apparatus has the processing tank 1. The treatment tank 1 is formed of a plate made of synthetic resin such as vinyl chloride and has a rectangular box shape with an upper surface open.

[0024] That is, if figure 2 and image 3 As shown, the processing tank 1 is formed by a first side plate 1a and a second side plate 1b positioned in the conveying direction of the substrate W, a front plate 1c and a rear plate 1d positioned in a direction intersecting the side plates 1a, 1b, and a bottom plate 1e. The above-mentioned box shape.

[0025] On the first side plate 1a and the second side plate 1b of the processing tank 1, an opening-shaped inlet 2 inclined at a certain angle with respect to the front-rear direction of the processing...

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PUM

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Abstract

The objective of the present invention is to provide a processor whose rigidity improved without thickening a plate forming a processing tank. The processor for processing a substrate is provided with: the processing tank which is formed in a box shape where an upper face is opened by the plate, and in which a take-in port of the substrate is made on one side face and a take-out port on the other side face; a reinforcement frame which is integrally installed along an outer peripheral face at an upper part of the processing tank and forms the processing tank; and a lid member which is fitted to the reinforcement frame so that it can turn and opens / closes an upper opening of the processing tank.

Description

technical field [0001] The present invention relates to a processing apparatus for processing a substrate transported into a processing tank using a processing liquid such as a chemical solution. Background technique [0002] For example, in the manufacturing process of a liquid crystal display device and a semiconductor device, there are so-called etching treatment of a glass substrate and a semiconductor wafer as substrates, and stripping treatment of a resist used as a mask after the etching treatment. The process of cleaning the substrate after etching and stripping. In the substrate processing process described above, a page-by-sheet method is employed in which substrates are processed while being transported one by one. [0003] There is known a processing apparatus that processes a substrate by spraying a processing liquid from a shower nozzle onto the upper, lower, or upper surfaces while the substrate is being conveyed when the substrate is processed by the sheet-b...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/00H01L21/30
CPCF04D29/526H01L21/02H01L21/67034
Inventor 末吉秀树矶明典
Owner SHIBAURA MECHATRONICS CORP