Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Sub nano grade double frequency laser interferometer signal subdivision system

A dual-frequency laser interference and signal subdivision technology, applied in the direction of instruments, optical devices, measuring devices, etc., can solve the problems of limited precision, limited moving speed, limited, etc., achieve high stability and reliability, improve Subdivision accuracy, the effect of high subdivision accuracy

Inactive Publication Date: 2009-09-16
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The traditional phase-locked loop-based subdivision method is limited by the moving speed of electronic devices and measurement targets, and the digital phase detection subdivision method based on pulse filling is also limited by the counter, so the improvement of accuracy is very limited

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Sub nano grade double frequency laser interferometer signal subdivision system
  • Sub nano grade double frequency laser interferometer signal subdivision system
  • Sub nano grade double frequency laser interferometer signal subdivision system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0011] Such as figure 1 As shown, the embodiment of the present invention consists of a measurement signal preprocessing circuit 1, a reference signal preprocessing circuit 2, a digital phase detection circuit 3, a main clock signal generating circuit 4, a phase shifter group 5, a counting circuit 6, a counter group 7 and an operation The processing circuit 8 is composed of the measurement signal preprocessing circuit 1 and the reference signal preprocessing circuit 2. After completing the photoelectric detection, amplification, filtering and shaping of the measurement signal and the reference signal respectively, the output is two channels of square wave digital signals, which are sent to the digital identification The phase circuit 3 conducts phase detection and outputs a digital pulse signal with a certain width. The rising edge of the output signal of the digital phase detection circuit 3 drives the main clock generation circuit 4 to generate a clock signal, and drives the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A signal subdivision system of subnano-grade double frequency laser interferometer comprises preprocessing circuit of measurement signal and reference signal, digital phase demodulation circuit, master clock signal generating circuit, phase shifter set, counting circuit, counter set and operation treatment circuit. It is featured as enabling to make measurement accuracy of double frequency laser interferometer be on subnano-grade by utilizing above said circuits and above said devices.

Description

technical field [0001] The invention is a sub-nanometer signal subdivision system, which is applied to a dual-frequency laser interferometry system and can be widely used in online displacement measurement, error correction and control of ultra-large-scale integrated circuit processing equipment, precision machine tools, and the like. Background technique [0002] my country has always lagged behind developed countries in the field of ultra-large-scale integrated circuit manufacturing. One of the important reasons is that the development level of lithography equipment in my country is backward. A key bottleneck restricting the improvement of lithography equipment is the lack of self-developed high-precision measurement systems. Dual-frequency laser interferometer is one of the most successful applications of laser in the field of metrology. It is the most authoritative length measuring instrument in lithography equipment and an indispensable measuring tool in the precision ma...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01B9/02G01B11/00
Inventor 邓玖根唐小萍胡松张正荣邢薇严伟
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products