Unlock instant, AI-driven research and patent intelligence for your innovation.

Magnetic disk substrate and production method of magnetic disk

A manufacturing method and substrate technology are applied in the field of magnetic disk manufacturing to achieve the effect of reducing scratches and improving the pass rate

Inactive Publication Date: 2007-08-01
RESONAC HOLDINGS CORPORATION
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In other words, aluminum-type substrates can easily provide magnetic disks with excellent magnetic characteristics, but involve problems with flatness due to the plastic deformation they undergo during mechanical treatments such as polishing

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0026] By using a diamond fixed abrasive at a disc speed of 15rpm and 100g / cm 2 A 2.5-inch lithium silicate type crystallized glass substrate was ground to a predetermined thickness under a processing pressure of (approximately 7354 Pa). Next, through the rotation speed of the disc of 30rpm and the speed of 55g / cm 2 Polishing was performed for 40 minutes at (approximately 5393 Pa) by setting the processing rate at 0.10 to 0.15 μm / min and the pad groove width at 3 mm. After rinsing with water, surfactant and isopropanol and then drying, the final glass substrates (150 per batch) were inspected for scratches by optical microscopy. As a result, the rejection rate due to the presence of scratches was about 1% on average. On the glass substrate of the qualified product obtained at last, a 60nm chromium film as the base layer and a 20nm Co 13 Cr 6 Pt 3 Ta alloy film and a 10nm diamond-like carbon film as a protective layer. Furthermore, a perfluoropolyether lubricating layer w...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a production method for a magnetic disk substrate capable of reducing the number of scratches occurring on the surface of a glass substrate and improving the yield of the glass substrate. When a surface of a magnetic disk substrate is polished by using polishing plates each having a pad, an amorphous or crystallized glass substrate is polished by setting a processing rate to 0.15 m / min or below and a pad groove width to 2 to 4 mm. Furthermore, a chemical tempered glass substrate is polished by setting the processing rate to 0.15 m / min or below.

Description

[0001] Cross References to Related Applications [0002] This application is an application filed under 35 U.S.C. §111(a) pursuant to 35 U.S.C. §119(e) requiring provisional application number 60 / 607304 filed September 7, 2004 under 35 U.S.C. §111(b) purpose interest. field of invention [0003] The invention relates to a magnetic disk substrate and a manufacturing method of the magnetic disk. Background technique [0004] Due to the excellent cost performance of the magnetic disk device, the magnetic disk device has achieved remarkable progress as an external storage device of a computer, and further development of the magnetic disk device can be expected. Aluminum type substrates have been used in the past as substrates for magnetic disks mounted to magnetic disk devices, but glass substrates, such as chemically tempered glass and crystallized glass, are gradually gaining wider popularity due to their high impact resistance and the ability to be easily made flat Applicat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24B37/04B24B37/00G11B5/84
CPCG11B5/8404B24B57/04C03C19/00B24B37/042
Inventor 町田裕之会田克昭
Owner RESONAC HOLDINGS CORPORATION