Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Gas hermetic apparatus and hermetic method of glass base plate annealing furnace

A glass substrate and annealing furnace technology, applied in the field of ultra-thin glass substrate manufacturing

Inactive Publication Date: 2007-08-08
HENAN ANCAI HI-TECH +1
View PDF0 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The present invention aims to overcome the deficiencies in the prior art and provide a gas-tight device and airtight seal for a glass substrate annealing furnace that reduces the defects caused by gas flow during the annealing process, thereby greatly improving the yield of glass substrates. method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Gas hermetic apparatus and hermetic method of glass base plate annealing furnace
  • Gas hermetic apparatus and hermetic method of glass base plate annealing furnace
  • Gas hermetic apparatus and hermetic method of glass base plate annealing furnace

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] As shown in the air lock system at the lower end of the annealing furnace in Figure 1, the clean air is heated to the necessary temperature by heating the metal heat sink 103, and the preheated clean air passes through the blower 106 to form a gas blocking layer at the lower end of the glass ribbon, and the grid-shaped regulating plate 104 It is used to adjust the direction angle of the air curtain, to minimize the possibility of the air curtain returning to the upper side after it touches the glass ribbon, and to add an air tractor 105 at a suitable position at the lower end, which is used to form a negative pressure at the lower end of the air curtain , thus pulling the return air of the air curtain to flow downward.

[0027] Similarly, the inlet of the air traction machine 105 (traction fan) adopts the structure of grid-shaped regulating plate 104, which is used to adjust the wind direction for its formation of traction. The air volume produced by the air tractor 105...

Embodiment 2

[0029] As shown in the air lock system at the lower end of the annealing furnace in Figure 1, the clean air is heated to the necessary temperature by heating the metal heat sink 103, and the preheated clean air passes through the blower 106 to form a gas blocking layer at the lower end of the glass ribbon, and the grid-shaped regulating plate 104 It is used to adjust the direction angle of the air curtain, to minimize the possibility of the air curtain returning to the upper side after it touches the glass ribbon, and to add an air tractor 105 at a suitable position at the lower end, which is used to form a negative pressure at the lower end of the air curtain , thus pulling the return air of the air curtain to flow downward.

[0030] Adjust the grid-shaped wind direction plate 104 at the outlet of the blower 106 so that the return air flows as far as possible below the annealing furnace. Gradually increase the deflection direction of the grid-shaped wind direction plate 104, ...

Embodiment 3

[0032] As shown in the air lock system at the lower end of the annealing furnace in Figure 1, the clean air is heated to the necessary temperature by heating the metal heat sink 103, and the preheated clean air passes through the blower 106 to form a gas blocking layer at the lower end of the glass ribbon, and the grid-shaped regulating plate 104 It is used to adjust the direction angle of the air curtain, to minimize the possibility of the air curtain returning to the upper side after it touches the glass ribbon, and to add an air tractor 105 at a suitable position at the lower end, which is used to form a negative pressure at the lower end of the air curtain , thus pulling the return air of the air curtain to flow downward.

[0033] FIG. 5 is an effect diagram of air curtain formation without using the air tractor 105 and at the same time, the blower 106 has no deflection angle. It can be found that the return air after the air curtain reaches the glass substrate will dissipat...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a gas sealing device and method of glass base annealing furnace in the LED and organic luminous display, which comprises the following parts: gas source to generate gas lock air, aerator under the annealing furnace corresponding to glass base in connection with gas source, grid plate with angle adjustable in the outlet of aerator, drawing fan on the lower end of aerator and grid plate with angle adjustable in the inlet of drawing fan.

Description

technical field [0001] The invention belongs to the field of manufacturing ultra-thin glass substrates, and in particular relates to a gas-tight device and a sealing method for a glass substrate annealing furnace used for annealing ultra-thin glass used in displays such as liquid crystals and organic light-emitting displays. technical background [0002] With the development of display devices, new display devices are constantly being developed. The glass used in liquid crystal display devices and organic light-emitting display devices plays a very important role in these display devices. The quality of the glass directly affects the quality of the product. Quality. In recent years, due to the improvement of various performances of liquid crystal displays, the quality requirements for glass have become more stringent. In particular, micro transistors and various graphics used for display should be formed on the surface of TFT liquid crystal glass, because these graphics are f...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C03B25/00
Inventor 李栋王晶
Owner HENAN ANCAI HI-TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products