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Anticorrdant stripping waste liquor regeneration method and device

A technology for stripping waste liquid and regenerating device, which is applied in chemical instruments and methods, neutralization water/sewage treatment, other seating furniture, etc. Effects of Environmental Pollution

Active Publication Date: 2011-08-24
DONGJIN SEMICHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In addition, various attempts have been made to regenerate the resist stripping waste liquid by other methods, but since the organic solvent and various amine compounds are separated at one time, it is not suitable for various subdivided products using specialized amine compounds. The photoresist and the stripping waste liquid generated during the stripping process are regenerated, and when various resists and stripping liquids are used in the semiconductor and display manufacturing processes, since the existing resist stripping liquid regeneration method adopts It is a method of one-time separation of organic solvents and various amine compounds, so its utilization is limited, and it is further required to remove resist, moisture, and organic amine compounds in resist stripping waste liquid only economically. Method for Regenerating Organic Solvents

Method used

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  • Anticorrdant stripping waste liquor regeneration method and device
  • Anticorrdant stripping waste liquor regeneration method and device
  • Anticorrdant stripping waste liquor regeneration method and device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0078] In each resist stripping process obtained by containing 3 parts by weight of resist, 5 parts by weight of amine compound MEA, 5 parts by weight of amine compound MIPA, 5 parts by weight of amine compound n-MEA, 10 parts by weight of water, 72 parts by weight of organic 10.6 parts by weight of oxalic acid dihydrate was added to the stripping waste liquid of the solvent (50 parts by weight of dihydric alcohol and 22 parts by weight of alkylpyrrolidone), and an amine-oxalic acid compound was formed and precipitated. Oxalic acid dihydrate that did not participate in the reaction remained in the stripping waste liquid as a solid component. The stripping waste liquid in which the amine-oxalic acid compound was formed was filtered with a filter to remove solid content. The precipitated amine-oxalic acid compound and unreacted oxalic acid dihydrate were removed by the above filtration so that the total amine compound was less than 0.1 parts by weight relative to 100 parts by we...

Embodiment 2

[0080] In the resist containing 3 parts by weight of resist, 4 parts by weight of amine compound MEA, 4 parts by weight of amine compound MIPA, 4 parts by weight of amine compound n-MEA, 20 parts by weight of water, and 65 parts by weight of 8.5 parts by weight of oxalic acid dihydrate was added to the stripping waste liquid of the organic solvent (45 parts by weight of dihydric alcohol and 20 parts by weight of alkylpyrrolidone) to form and precipitate an amine-oxalic acid compound. Oxalic acid dihydrate that did not participate in the reaction remained in the stripping waste liquid as a solid component. The stripping waste liquid in which the amine-oxalic acid compound was formed was filtered with a filter to remove solid content. The precipitated amine-oxalic acid compound and unreacted oxalic acid dihydrate were removed by the above filtration so that the total amine compound was less than 0.1 parts by weight relative to 100 parts by weight of the filtered stripping waste ...

Embodiment 3

[0082] In the resist obtained from each resist stripping process, 2 parts by weight of resist, 3 parts by weight of amine compound MEA, 3 parts by weight of amine compound MIPA, 3 parts by weight of amine compound n-MEA, 30 parts by weight of water, 59 parts by weight of organic 6.4 parts by weight of oxalic acid dihydrate was added to the stripping waste liquid of the solvent (41 parts by weight of dihydric alcohol and 18 parts by weight of alkylpyrrolidone) to form and precipitate an amine-oxalic acid compound. Oxalic acid dihydrate that did not participate in the reaction remained in the stripping waste liquid as a solid component. The stripping waste liquid in which the amine-oxalic acid compound was formed was filtered with a filter to remove solid content. The precipitated amine-oxalic acid compound and unreacted oxalic acid dihydrate were removed by the above filtration so that the total amine compound was less than 0.1 parts by weight relative to 100 parts by weight of...

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Abstract

The invention provides a recycling method of a resist stripper scrapped liquid, especially suitable for economical recycling a resist stripper scrapped liquid which is generated when in a stripping process using a stripper scrapped liquid containing various special amine compounds and when using various resists and stripper scrapped liquid, and a recycling device thereof. The recycling device is suitable for being used in the recycling method. The recycling method of the invention is a method for recycling a resist stripper scrapped liquid containing water, resists, amine compounds and an organic solvent, the method is characterized by containing: (a) an acid adding process in which an acid is reacted with the amine compounds of the resist stripper scrapped liquid so that the amine compounds is precipitated as amine-acid manner from the stripper scrapped liquid; (b) a process for filtering the amine-acid compounds precipitated in the process (a) from the stripper scrapped liquid; and (c) a process for distilling the stripper scrapped liquid in which amine is removed in the process (b), so as to obtain the organic solvent.

Description

technical field [0001] The present invention relates to a method for regenerating resist stripping waste liquid and a regeneration device, in particular to the following method and device for regenerating resist stripping waste liquid. The method of regenerating the resist stripping waste liquid, which is especially suitable for the stripping process using the stripping liquid containing various special amine compounds and the time when using various resists and stripping liquids. The generated resist stripping waste liquid is regenerated. Background technique [0002] In order to manufacture semiconductor elements such as integrated circuits (ICs), high integrated circuits (LSIs), and ultrahigh integrated circuits (VLSIs), and display devices such as liquid crystal display elements, it is necessary to repeatedly implement multi-stage photolithography processes and resist stripping processes. This generates a large amount of resist stripping waste liquid. In particular, du...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42G03F7/26H01L21/027C02F9/10C02F1/66C02F1/58C02F1/04
CPCG03F7/425G03F7/423G03F7/422G03F7/3071C11D2111/22G03F7/34
Inventor 李骐范金柄郁朴美仙洪振燮任润吉尹锡壹
Owner DONGJIN SEMICHEM CO LTD