Assembly for purifying toxic gases from production processes
A toxic gas, clean production technology, applied in the combustion method, lighting and heating equipment, combustion type, etc., to achieve the effect of effective follow-up treatment
Active Publication Date: 2007-09-05
CENTROTHERM CLEAN SOLUTIONS GMBH & CO KG
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Problems solved by technology
However, the problem of the load brought by the high temperature in the reaction chamber still exists
The result is that it requires more maintenance
Method used
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[0031] FIG. 1 presents a schematic cross-sectional view of a device for cleaning toxic gases generated during production, which device has a reaction chamber 1 composed of an outer wall 2 and an inner wall 3 . The inner wall 3 gradually narrows downward in a funnel shape at a predetermined angle.
[0032] The uniform water film 4 flows downward along the inside of the inner wall 3 of the reaction chamber 1 which gradually narrows downward. The water film is represented in FIG. 1 by a dotted line. In order to achieve this, the water jacket is located in the intermediate space 5 between the inner wall 3 and the outer wall 2 of the reaction chamber, into which water is continuously fed in a given amount so that the water supplied is higher than the upper edge 6 of the inner wall 3 , and a water film is formed on the inner side of the inner wall 3 .
[0033] For this purpose, the outer wall 2 and the inner wall 3 are connected to each other at the bottom by means of a circular b...
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The invention relates to an assembly for purifying toxic gases from production processes by thermal conversion in a reactor chamber and to the subsequent treatment of the reaction products with a sorption agent in a washing device in order to bind water-soluble reaction products and to elute solid reaction products. The aim of the invention is to achieve a highly effective purification with a high gas throughput, whilst at the same time obtaining the extremely efficient cooling of the reaction chamber. To achieve this: the reactor chamber (1) consists of an external and internal wall (2, 3), the internal wall (3) tapering at the base in the form of a funnel at a predetermined angle; a unit for the thermal treatment of the toxic gases is located on the reactor chamber (1), sealing the top of said chamber; the inner face of the internal wall (3) of the reactor chamber (1) that tapers at the base comprises a film of water (4) flowing downwards in a uniform manner; the exterior of the internal wall of the reactor chamber (1) is surrounded by a cloak of water; and a waste gas outlet (11) and a connection (12) for a water circuit are located at the lower end of the tapering internal wall (3).
Description
technical field [0001] The present invention relates to a device for cleaning toxic gases generated in the production process. With this device, thermal decomposition is carried out in a reaction chamber, and the reaction product is subjected to subsequent treatment with an absorbent in the cleaning device to make it soluble in The water reaction product is combined and the solid reaction product is eluted. Background technique [0002] Toxic gases such as these are produced in large quantities in the manufacture of semiconductor circuits and cannot be discharged into the environment untreated due to their toxicity. Examples of these toxic gases are HF, SiH 2 Cl 2 、SiCl 4 , NH 3 、C 2 f 6 ,PH 3 , BCl 3 、NF 3 etc. [0003] It is well known that most of these waste gases from semiconductor manufacturing processes or from other chemical reactions can be rendered harmless by oxidation or thermal decomposition. In principle, thermal decomposition is achieved by burning ...
Claims
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IPC IPC(8): B01D53/46B01D53/68B01D53/78F23G7/06
CPCF23G7/065B01D53/18B01D53/46B01D53/68B01D53/78F23G7/06
Inventor 罗伯特·迈克尔·阿通
Owner CENTROTHERM CLEAN SOLUTIONS GMBH & CO KG