Combined structure of image sensing wafer and glass substrates and manufacturing method therefor
An image sensing and glass substrate technology, applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve the problems of sensing sensitivity, inconvenience, sealant 130 overflow and other problems of sensing element failure, to avoid Deterioration of sensing sensitivity, effect of sensing sensitivity
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[0043] In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the combination structure and manufacturing method of the image sensing chip and glass substrate proposed according to the present invention will be described below in conjunction with the accompanying drawings and preferred embodiments. Specific embodiments, structures, methods, steps, features and effects thereof are described in detail below.
[0044] Please refer to FIG. 2 , which is a schematic cross-sectional view of a combined structure of an image sensing chip and a glass substrate according to a specific embodiment of the present invention. A combination structure 200 of an image sensing chip and a glass substrate in a preferred embodiment of the present invention mainly includes an image sensing chip 210 and a glass substrate 220 .
[0045] The image sensing chip 210 has an active surface 211, the active surface 211 includes a ...
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