Description point data acquiring method and device, description method and device
A technology for obtaining devices and drawing points, which is applied in image data processing, photolithography process exposure devices, instruments, etc., and can solve problems such as limited processing capacity, increased cost, and difficult substrate placement
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[0104] Hereinafter, the drawing point data acquisition method and device, and the drawing method and device according to the present invention will be described in detail with reference to preferred embodiments shown in the accompanying drawings.
[0105] FIG. 1 is a perspective view showing a schematic configuration of an embodiment of an exposure apparatus to which a drawing apparatus of the present invention is applied for carrying out the drawing method of the present invention. The exposure device illustrated in the figure is a device for exposing various patterns such as wiring patterns of each layer of a multilayer printed wiring board, and is characterized in that the method of obtaining exposure point data used for exposing the pattern is first The schematic configuration of the exposure apparatus will be described.
[0106] As shown in FIG. 1 , the exposure device 10 includes: a rectangular plate-shaped moving stage 14, which is configured to absorb and hold the subs...
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