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Reticle pod with isolation system

一种光罩、振动隔离的技术，应用在光学、光机械设备、用于光机械处理的原件等方向，达到增强减震及减振的效果

Inactive Publication Date: 2008-04-23
ENTEGRIS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

As reticle sizes continue to evolve, the small volume of reduced-diameter reticles that support the reticle delivery environment becomes increasingly difficult if the SMIF pod is a legacy SMIF pod designed for an earlier generation of larger reticle sizes. more and more challenging

Method used

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  • Reticle pod with isolation system

Examples

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Embodiment Construction

[0042] Relative terms such as up-down, front-back, left-right, etc. mentioned herein are intended for convenience of description, and are not intended to limit the present invention or its components to any position or specific orientation. All dimensions shown in the drawings may vary with potential designs and intended uses of specific embodiments of the invention without departing from the scope of the invention.

[0043] Each of the figures and methods disclosed herein can be used alone or in combination with other features and methods to provide improved containers and methods for making and using the same. Therefore, combinations of features and methods disclosed herein may not be necessary to practice the invention in the broadest sense, but are disclosed only to specifically illustrate representative and preferred embodiments of the invention.

[0044] Reference is now made to FIG. 1 , which illustrates a reticle container 10 (also referred to as a reticle "cassette" o...

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Abstract

The present invention provides a reticle container that is equipped with a secondary container which houses the reticle and is housed in the primary container. The secondary container is held within the primary container with shock and vibration isolation members so that the secondary container has multiple degrees of freedom of motion within the primary container. The reticle is secured inside the secondary container such that shock and vibration transmission from the reticle container to the reticle is substantially attenuated.

Description

[0001] Related applications [0002] This application claims to be based upon U.S. Provisional Application Nos. 60 / 657,616, filed February 27, 2005, U.S. Provisional Application Nos. 60 / 657,355, filed February 27, 2005, and The title of US Provisional Application with unknown serial number (Attorney Docket No. 2267.1110US01), which is hereby incorporated by reference in its entirety. technical field [0003] The present invention relates to substrate carriers, and more particularly to processor carriers and transporters, and more particularly to reticle containers. Background technique [0004] Photolithography is one of the process steps often encountered when processing silicon wafers in semiconductor applications. In photolithography, a silicon nitride-deposited wafer surface is coated with a photosensitive liquid polymer or photoresist, and the wafer surface is then selectively exposed to a radiation source using a template bearing the desired pattern. Typically, ultra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B65D85/00
CPCH01L21/67386H01L21/67353G03F7/70741H01L21/67359H01L21/67369H01L21/67376G03F1/66B65D85/00H01L21/673B65D85/38
Inventor B·格雷格森D·哈伯梅尔S·森纳B·怀斯曼A·M·蒂本J·斯特里克
Owner ENTEGRIS INC
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