Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Protective film assembly container

A technology of protective film and storage container, which is applied to instruments, electrical components, original parts for opto-mechanical processing, etc. The effect of the chance of the pellicle assembly

Inactive Publication Date: 2010-12-29
SHIN ETSU CHEM IND CO LTD
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0011] However, the vacuum forming method cannot form a thick wall. Although ribs can be used for some reinforcement, it is basically made by bending a sheet of the same thickness. Therefore, it is still difficult to obtain high rigidity by using this method. Items

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Protective film assembly container
  • Protective film assembly container
  • Protective film assembly container

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0063] Hereinafter, embodiments of the present invention will be described, but the present invention is not limited thereto. The antistatic ABS resin sheet (t=3mm, black) is made into a pellicle container body 2 having a shape as shown in FIG. 1 by vacuum forming.

[0064] The central part of the container body is relatively high, and the protective film assembly can be placed thereon.

[0065] Next, an ABS resin sheet (t=3 mm, transparent) capable of preventing static electricity was manufactured into a cover body 1 having a shape as shown in FIG. 1 by vacuum forming. The cover body 1 is provided with ribs 3 at five places on the upper surface, the ribs at four places have a height of 20 mm and a width of 50 mm, and the central rib has a height of 20 mm and a width of 100 mm.

[0066] Certainly, the cover body 1 can be fitted on the container body 2, and the assembled appearance is as shown in FIG. 1 . The overall size is length 1450×width 1330×height 95mm.

[0067] The p...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a protection film component keeping container which has an enough rigidity to bear the attack of an external force during the pipe storage and conveyance and can prevent the absorption by the strong external air during the opening of a cover and a foreign substance from adhering to a protection film component. To achieve the aim, a resin sheet is molded to be used as a cover body (1) for the protection film component keeping container, the surface of the cover body (1) is provided with a rib part (3) which forms with a short edge of the cover body (1) an angle no greater than 10DEG and does not cross with the other rib parts. As the rib parts are not cut off by other ribs, the rigidity of the rib part (3) on the upper and lower sides (in the vertical direction) is greatly improved, and the deformation of the cover body and the damage to the protection film component as a result of the external force can be prevented.

Description

technical field [0001] The present invention relates to a pellicle storage container, which can accommodate, store, and transport pellicle pellicles used as dust-proof devices when we manufacture products such as semiconductor devices, printed substrates, and liquid crystal displays. Background technique [0002] In the manufacture of semiconductor devices such as LSI or liquid crystal displays, semiconductor wafers or glass substrates for liquid crystals are irradiated with light to form patterns. If there is dust attached to it, the dust will block the light or refract the light, which will damage the transferred pattern. [0003] Therefore, these operations are usually carried out in a clean room, but even so it is still quite difficult to keep the photomask clean. Therefore, a method of attaching a protective film component to the surface of the photomask as a dust-proof device is adopted. [0004] At this time, the foreign matter is not directly attached to the surface...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/00B65D85/86G03F1/62H01L21/027H01L21/673
CPCG03F1/62G03F1/66
Inventor 关原一敏
Owner SHIN ETSU CHEM IND CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com