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Position detecting method and device, patterning device

A detection method and technology of a detection device, which are applied in the photoengraving process of the pattern surface, the exposure device of the photoengraving process, the testing/measurement of semiconductor/solid state devices, etc., can solve the problems of increasing the processing time of the substrate and reducing the productivity, etc.

Inactive Publication Date: 2010-11-03
DAINIPPON SCREEN MTG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, if the secondary positioning (high magnification and low magnification secondary shooting) of pre-positioning and fine positioning is performed in this way, it will increase the processing time for the substrate and reduce the productivity. Therefore, improvement measures are expected.

Method used

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  • Position detecting method and device, patterning device
  • Position detecting method and device, patterning device
  • Position detecting method and device, patterning device

Examples

Experimental program
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Effect test

no. 1 approach

[0052] 1-1. Structure

[0053] figure 1 and figure 2 It is a figure of the structure of the pattern drawing apparatus 1 which has the function of the position detection apparatus of 1st Embodiment, figure 1 is the side view, figure 2 is a top view. In the process of manufacturing a color filter for a liquid crystal display device, the pattern drawing device 1 is used to place a photosensitive material (in this embodiment, a color-resist) on a glass substrate for a color filter (hereinafter referred to as "substrate"). 9 means for drawing a prescribed pattern. like figure 1 and figure 2 As shown, the pattern drawing device 1 is mainly provided with a base 11, a stage 10 for loading a substrate 9, a drive unit 20 for driving the stage 10 relative to the base 11, and two tools for positioning the plurality of exposure heads 30 and the substrate 9. 41 cameras.

[0054] In addition, in the following description, the three-dimensional XYZ Cartesian coordinates shown in a ...

no. 2 approach

[0110] Next, a second embodiment will be described. Hereinafter, description will be given mainly on points different from the first embodiment. In the first embodiment, each of the positioning marks 60 records its own position. On the contrary, in the second embodiment, each of the plurality of positioning marks 60 does not record its own position, but records identification information for identifying itself from other positioning marks 60 , and the position of the positioning mark 60 can be specified based on the identification information.

[0111] Figure 14 It is a figure which exemplifies the content of the information recorded in each positioning mark 60 contained in one positioning area 92 of 2nd Embodiment. In each positioning mark 60 in the figure, the content of the information indicated by the positioning mark 60 is shown in parentheses. As shown in the figure, each positioning mark 60 does not record its own position, but records two letters. These two letter...

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Abstract

The invention provides a technology capable of detecting the position of the object to be detected by a single image capturing operation. A substrate to be processed by a patterning device has a group of a plurality of alignment marks formed within a predetermined area as an alignment area, each of the plurality of alignment marks being an information recording code that records its own location relative to a reference position on the substrate. In alignment of the substrate, an image of such an alignment area that includes a group of the plurality of alignment marks is captured. Thus, even if the area of image capturing is reduced with increasing image magnification, at least one of the plurality of alignment marks can be included in the image. One of the alignment marks whose images areincluded in this image is defined as a target mark, and the position of the substrate is derived based on the target mark in the image. Thus, the position of the substrate can be detected by a singleimage capturing operation.

Description

technical field [0001] The present invention relates to a technique for detecting the position of an object to be detected arranged in a predetermined arrangement area. Background technique [0002] In a pattern drawing device that draws a fine pattern on a substrate such as a color filter substrate of a liquid crystal display device, a glass substrate for a flat panel display (FPD) such as a liquid crystal display device or a plasma display device, a semiconductor substrate, or a printed circuit board, etc., for To perform processing with high precision, it is necessary to accurately align the substrate to be processed at a predetermined ideal position. Therefore, various techniques for detecting the position of a substrate loaded in a predetermined arrangement area have been proposed so far. [0003] For example, in a conventional representative technique, an alignment mark is marked in advance at a predetermined position on a substrate, and the surrounding area of ​​the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F9/00G03F7/20
CPCG03F9/7088G03F9/7046G03F9/7076G03F7/70391H01L22/00
Inventor 井上正雄
Owner DAINIPPON SCREEN MTG CO LTD
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