Device for etching TFT LCD glass substrate and etching method thereof

Abstract

The invention discloses an etching device for a TFT LCD glass substrate and etching method thereof, wherein, the device comprises two bearing boxes, two etching washing grooves, a washing groove and a drying groove; the method is that one of the bearing boxes with a plurality of TFT LCD glass substrates are etched and first-step washed in the etching washing groove; then the bearing box is transferred to the washing groove to be second-step washed; meanwhile, the other bearing box with a plurality of TFT LCD glass substrates are arranged in the other etching washing groove to be etched and first-step washed; the washed TFT LCD glass substrates in the first bearing box are placed in the drying groove to be dried, meanwhile, the other bearing box is transferred to the washing groove to have a plurality of TFT LCD glass substrates second-step washed; then the washed TFT LCD glass substrates in the second bearing box are dried in the drying groove; therefore, the etching of a plurality of TFT LCD glass substrates in the two bearing boxes can be simultaneously finished in one processing, thereby achieving the effect of shortening the etching time and simplifying the etching process.

Description

technical field [0001] The present invention relates to an etching device and an etching method for a TFT LCD glass substrate, in particular to a method capable of simultaneously completing the etching of a plurality of TFT LCD glass substrates with two carrier cassettes in one process, so as to shorten the etching time and simplify the etching process An etching device for a TFT LCD glass substrate and an etching method thereof. Background technique [0002] The general prior art, such as "Automatic Etching Device and Etching Method of Glass Substrate for TFT LCD", such as China Taiwan Patent Gazette Announcement No. 543113, its automatic etching device mainly includes: [0003] An etching tank, which is provided with a porous bubbling device inside, and a beating device is provided on the upper side of the bubbling device, and a processing solution is injected into the etching tank to etch a thin film transistor loaded in an etching cassette Glass substrates for liquid cr...

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Problems solved by technology

[0013] Although the above-mentioned existing "automatic etching device and etching method for glass substrates for TFT LCDs" can achieve automatic etching of glass substrates for TFT LCDs, it can only be used for the TFTs in one etching cassette during etching. The steps of etching, secondary cleaning and drying of the LCD glass substrate are carried out. If the glass substrate for TFT LCD in the two etching cassettes is to be etched, the glass substrate for TFT LCD in the first etching cassette must be etched. After etching in the etching tank, use the first and second rapid washing tanks for secondary cleaning, and after drying through the drying tank, take the glass substrate for TFT LCD in the second etching cassette and carry out in the etching tank Etching, secondary cleaning and drying, etc., cannot complete the etching of the glass substrate for TFTLCD in the two etching cassettes in one process, resulting in increased etching time and complicated etching process

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