Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

X-Y-Z three freedom degree tandem type nanometer grade microposition workstation

A degree of freedom and serial technology, applied to the parts of the instrument, instruments, shells, etc., can solve the problems of three degrees of freedom parallel coupling control difficulties and achieve high resolution effects

Inactive Publication Date: 2008-10-15
上海青客时尚生活服务股份有限公司
View PDF2 Cites 23 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among the two positioning platforms, the former only has the degree of freedom of movement in the horizontal direction, and the latter only has the degree of freedom in the vertical direction. Due to this restriction, a point on the movement platform cannot reach any position in space. In addition, the parallel coupling of the three degrees of freedom also gives control makes it difficult

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • X-Y-Z three freedom degree tandem type nanometer grade microposition workstation
  • X-Y-Z three freedom degree tandem type nanometer grade microposition workstation
  • X-Y-Z three freedom degree tandem type nanometer grade microposition workstation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] The embodiments of the present invention are described in detail below in conjunction with the accompanying drawings: this embodiment is implemented on the premise of the technical solution of the present invention, and detailed implementation methods and specific operating procedures are provided, but the protection scope of the present invention is not limited to the following the described embodiment.

[0020] Such as figure 1 As shown, this embodiment includes a base 1, a Z-direction displacement amplifier 2, a Y-direction displacement amplifier 3, an X-direction displacement amplifier 4, and a motion platform 5. The above parts are connected in sequence to form a series structure.

[0021] Such as figure 2 , the Z-direction displacement amplifier 2 includes: a rectangular structural frame connected by the first rigid straight rod 6, the second rigid straight rod 7, the third rigid straight rod 8, and the fourth rigid straight rod 13, extending from the first rigi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a serially-connected nano-scale micro positioning workbench which has X-Y-Z three-dimensional freedom degrees and comprises a base, a movable platform, an X-directional displacement amplifier, a Y-directional displacement amplifier and a Z-directional displacement amplifier; furthermore, the base, the Z-directional displacement amplifier, the Y-directional displacement amplifier, the X-directional displacement amplifier and the movable platform are sequentially connected into a serially-connected structure, and the displacements are respectively controlled between the freedom degrees; wherein, the X-directional displacement amplifier and the Y-directional displacement amplifier have the same structure. The serially-connected nano-scale micro positioning workbench has compact structure and large delivery stroke range, one point on the movable platform can reach any point in the delivery stroke range, and the serially-connected nano-scale micro positioning workbench can be applied to various occasions with strict space restriction and larger displacement requirement.

Description

technical field [0001] The invention relates to a workbench mechanism for micro-positioning and micro-operation in micro-mechanical technology, in particular to an X-Y-Z three-degree-of-freedom serial nano-scale micro-positioning platform, which can be applied to the fields of electronic device manufacturing, biomedicine, precision measurement and the like. Background technique [0002] Micro-positioning and micro-manipulation technology is an important research content of MEMS technology, which can provide necessary technology and equipment for nano-measurement, nano-manipulation and nano-assembly. At present, there are already many micro-positioning workbenches, most of which use piezoelectric ceramics (PZT) as drivers. Piezoelectric ceramics have many advantages such as high rigidity, large output thrust, fast frequency response, high displacement resolution and precision, etc., but the output per unit length The displacement is small, so the stroke of the table driven by...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G12B5/00G12B9/08
Inventor 刘品宽龙旦风徐博强冯恺恺
Owner 上海青客时尚生活服务股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com