Quick-opening type water-cooling structure polycrystalline silicon reducing furnace

Abstract

The invention relates to a quick opening polysilicon reducing furnace with a water cooling structure; the whole structure is in a vertical type. The invention comprises a main body (1) and an base plate (2), and the two are sealed with a gasket (4) and are pressed tightly with a quick opening bolt (3); wherein, the main body comprises an inner barrel (1.4), an outer barrel (1.5), a bottom flange (1.9), an inner shell cover (1.2), an outer shell cover (1.3), a baffle (1.6), a cooling water inlet (1.8), a cooling water outlet (1.1) and a water cooling double-glazing glass sight glasses (1.7); the base plate (2) comprises an upper tube plate (2.1), a lower tube plate (2.3), a baffle (2.4), an electrode (2.2), an air inlet (2.7), an air outlet (2.5), a cooling water inlet (2.6), a cooling water outlet (2.8) and an air outlet (2.9); the electrode (2.2) comprises a heater (2.2.1), a graphite head (2.2.2), a sonde (2.2.3), an electricity power source holding fixture (2.2.4), a cooling water inletting pipe (2.2.5) and a cooling water outletting pipe (2.2.6). The quick opening polysilicon reducing furnace has a reliable cooling structure, and can realize the long-term, secure and high-efficient operation of the reducing furnace.

Description

technical field [0001] The invention relates to a reduction furnace for producing polysilicon, in particular to a quick-opening and water-cooled polysilicon reduction furnace. It belongs to the technical field of polysilicon preparation. Background technique [0002] Polycrystalline silicon is the direct material for the production of monocrystalline silicon. High-purity polysilicon is the basic material of semiconductor devices such as photoelectric conversion cells and integrated circuits. With the rapid development of the world's semiconductor industry, a large number of applications of ultra-large-scale integrated circuits, and a large demand for photovoltaic cells, the demand for polysilicon in the whole world is increasing significantly. [0003] There are many ways to produce polysilicon, and the hydrogen reduction method is the most common method. The method is to pass the purified silicon halide and purified hydrogen into the reduction furnace as raw materials. I...

AI Technical Summary

Problems solved by technology

The main disadvantage of this patent is that the furnace body is welded by silver stainless steel clad plates, it is difficult to purchase raw materials, and the manufacturing cost of the reduction furnace will increase significantly, which is not conducive to large-scale application

The main disadvantage of this patent is that the sight mirror and electrodes do not adopt a water-cooled structure, which cannot guarantee long-term stable use in the reduction furnace under high temperature conditions exceeding 1000°C; the furnace body and base do not adopt a quick-opening structure, which makes it difficult to open the reduction furnace. And the operation time is longer

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