Radiation cooling film and preparation method and application thereof

A technology of thin films and ceramic particles, applied in the direction of coatings, etc., can solve the problems of complex preparation requirements, and achieve the effects of strong universality, improved reflectivity, and simple method.

Inactive Publication Date: 2020-09-29
SHANGHAI JIAO TONG UNIV
View PDF9 Cites 18 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is difficult for this technology to obtain high visible-near-infrared reflectivity and atmospheric window radiance at the same time. At the same time, it is difficult for the single-layer material of this method to simultaneously increase the visible-near-infrared reflectivity and infrared emissivity. Therefore, ceramics are required. Material layer to increase the mid-infrared radiation rate requires a metal layer to increase the reflectivity in the visible and near-infrared bands, and the preparation requirements are more complicated

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Radiation cooling film and preparation method and application thereof
  • Radiation cooling film and preparation method and application thereof
  • Radiation cooling film and preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0059] Stir and mix 200g of spherical alumina powder particles with a particle size (average particle size, the same below) of 2 microns and 220g of PDMS solution evenly, add 22g of tetraethyl orthosilicate curing agent to the above-mentioned curing precursor solution, and fully stir to mix Uniform; put the mixed solution into a vacuum drying oven to evacuate for 30 minutes, then slowly ventilate into the atmosphere until the air pressure is equal to the external pressure, and take out the mixed solution.

[0060] Put the multi-etched silicon wafer template for photolithography, dry etching, and wet etching on the glue homogenizer. The surface morphology of the template is composed of an array of pyramidal grooves with a width of 8 microns and a depth of 6 microns with an interval of 2 microns. The array of pyramidal grooves can be as figure 1 As shown; the mixed solution is slowly poured onto the template and left to stand for 20 minutes, then adjust the speed of the homogen...

Embodiment 2

[0064] Stir and mix 30g of zinc oxide powder particles with a particle size of 5 microns and 30g of PTFE solution evenly, add 3g of dicumyl peroxide curing agent to the above-mentioned curing precursor solution, stir fully to make it evenly mixed; put the mixed solution into Vacuum in a vacuum drying oven for 30 minutes, then slowly ventilate into the atmosphere until the air pressure is equal to that of the outside world, and take out the mixed solution.

[0065] Put the nickel-plated stainless steel template after ultra-precision processing on the glue homogenizer. The surface of the template is composed of a pyramid groove array with a width of 2 microns, a depth of 6 microns, and an interval of 3 microns; the mixed solution is slowly poured onto the template, and static Leave it for 5 minutes, then adjust the speed of the homogenizer from 0 to 500RPM for 10s, keep the speed of 500RPM for 30s, and then stop.

[0066] The template was removed and placed on a hot plate. The t...

Embodiment 3

[0068] Add 8g of spherical magnesia particles with a particle size of 0.5 microns and 16g of angular zirconia powder particles with a particle size of 2 microns to 30g of PDMS solution and stir to mix evenly; add 2g of dicumyl peroxide curing agent and continue stirring; mix the mixture Put it into a vacuum drying oven to evacuate and keep it for 60 minutes, then slowly ventilate into the atmosphere until the air pressure is equal to that of the outside world, and take out the mixed solution.

[0069] The IPS template after nanoimprinting was placed on a homogenizer. The surface morphology of the template was composed of an array of elliptical cylindrical grooves with a width of 15 microns, a depth of 10 microns, and an interval of 5 microns; the mixed solution was slowly poured onto the template and left to stand. Leave it for 5 minutes, then adjust the speed of the homogenizer from 0 to 750RPM for 10s, keep the speed of 750RPM for 15s, and then stop.

[0070]Remove the templ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
widthaaaaaaaaaa
thicknessaaaaaaaaaa
particle sizeaaaaaaaaaa
Login to view more

Abstract

The invention discloses a radiation cooling film which is formed by mixing ceramic particles, an organic solution and a curing agent, mixing the ceramic particles with an organic curing precursor solution, and curing, a micro-nano photon structure array is formed on the surface of the film, and the micro-nano photon structure array comprises a plurality of arrayed micro-nano photon structure elements. The invention further discloses a preparation method and application of the radiation cooling film. The film has the reflectivity of 95% in the sunlight band and the radiance of 96% in the atmospheric window band, can be lower than the ambient environment by 10 DEG C at most under the illumination condition, and also has good flexibility and strength and excellent hydrophobicity. The radiation cooling film is prepared in a low-cost and large-area manner by adopting a multi-etching double-spin-coating vacuum thermocuring process. The radiation cooling film is applied to the aspects of human body wearable cooling, cooling umbrellas and device heat dissipation, and a cooling method is achieved by removing heat from the surface and the interior of a main body in a heat radiation mode.

Description

technical field [0001] The invention belongs to the technical field of functional composite materials, and in particular relates to a radiation cooling film, its preparation method and its application. Background technique [0002] With the improvement of people's living standards and the development of urbanization, there is a huge demand for cooling technology and cooling equipment. Commonly used cooling equipment, such as refrigerators and air conditioners, rely on vapor compression refrigeration systems to achieve cooling effects. However, these cooling devices not only consume a large amount of energy, but also the use of refrigerants (such as hydrofluorocarbons) will cause global warming effects, which will further cause serious harm to the environment. Since the vast majority of refrigeration technology consumes non-renewable fossil resources, it actually produces more heat accumulation, making the earth hotter. Therefore, the large amount of heat generated by refri...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C08L83/04C08K13/04C08K7/18C08K5/5415C08L27/18C08K13/02C08K3/22C08K5/14C08K7/00C08L77/00C08L27/06C08L63/00C08J5/18B29C41/24
CPCC08J5/18B29C41/24C08J2383/04C08J2327/18C08K13/04C08K7/18C08K5/5415C08K13/02C08K2003/2296C08K5/14C08K2201/003C08K2003/2244C08K2003/2241C08J2477/00C08J2327/06C08K2003/2227C08J2463/00
Inventor 周涵张海文钱珍莉范同祥
Owner SHANGHAI JIAO TONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap