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Developing device and developing method thereof

A developing device and developing solution technology, applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve the problems of decreased chemical properties, difficulty in maintaining the electrical conductivity of the developing solution constantly, and increased electrical conductivity of the developing solution, etc. medicinal effect

Inactive Publication Date: 2008-12-24
KUNSHAN VISIONOX DISPLAY TECH +2
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] If the developer is in contact with ambient gases such as air, the carbon dioxide in the ambient gas will easily react with the developer to form various carbonates and accumulate, for example, carbonates of TMA (tetramethylammonium), etc. Shorter service life and rapid decline in chemical properties affect the quality of photoetched patterns
In addition, the partial dissociation of the carbonate in the developer will increase the conductivity of the developer, and it is difficult to maintain the conductivity of the developer constantly, which will affect the imaging performance.

Method used

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  • Developing device and developing method thereof
  • Developing device and developing method thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0035] Embodiment 1 provides a device for preventing the developer solution from reacting with air and other gases during the assembly line production process. This embodiment increases N in the existing developing tank 2 source 1. The roller 13 transfers the substrate 8 from the substrate inlet 11 into the developing tank. Open the flow regulating device 3 to make the developing tank 6 full of N 2 . Turn on the control switch of the developer, and the developer is sprayed onto the substrate through the developer liquid supply pipeline 5 and the nozzle 7 . During the developer spraying process, the flow regulating device is kept open, and the flow control device is controlled according to the gas discharge from the exhaust port 9 . After the development is completed, the substrate is conveyed out of the development tank by rollers.

Embodiment 2

[0036] Embodiment 2 provides a device and method for preventing the developer solution from reacting with air and other gases during the small-batch experimental production process. In this embodiment, an auxiliary pipeline 2 is added in the existing developing tank, and the auxiliary pipeline extends from the outside of the tank to the inside of the tank. One end of the auxiliary pipeline located outside the tank is connected to N 2 Source 1, the bottom of the auxiliary pipeline in the tank is evenly distributed with multiple N 2 Spout 4. Open the door 14 of the developing tank, and put the substrate to be developed on the rotating platform 15 . open N 2 Source and flow regulating device 3, so that the developing tank 6 is filled with N 2 . The control switch for controlling the developing solution is turned on, and the developing solution is sprayed onto the substrate through the developing solution supply pipeline 5 and the nozzle 7 . During the developer spraying pro...

Embodiment 3

[0037] Embodiment 3 also provides a device and method for preventing the developer solution from reacting with air and other gases during the assembly line production process. In this embodiment, an auxiliary pipeline 2 is added in the existing developing tank, and the auxiliary pipeline extends from the outside of the tank to the inside of the tank. One end of the auxiliary pipeline located outside the tank is connected to N 2 Source 1, the bottom of the auxiliary pipeline in the tank is evenly distributed with multiple N 2 Spout 4. The roller 13 transfers the substrate 8 from the substrate inlet 11 into the developing tank. open N 2 Source and flow regulating device 3, so that the developing tank 6 is filled with N 2 . The control switch for controlling the developing solution is turned on, and the developing solution is sprayed onto the substrate through the developing solution supply pipeline 5 and the nozzle 7 . During the developer spraying process, the flow regula...

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Abstract

The invention discloses a developing device and a developing method thereof; the developing device comprises a groove body, liquid feeding pipelines for developing solution, a nozzle for developing solution and a draining port for the developing solution; the groove body is filled with gas in the developing process and an opening communicated with the outside environment is also arranged on the groove body; a base plate to be developed is fed into the developing groove, then a gas source is opened, the gas enters and fills the groove body and then the developing solution is sprayed; the device and the method can ensure that the developing solution is in protective atmosphere of gas which does not react with the developing solution and separates from air or other gases which can react with the developing solution, thus keeping the stability and persistence of the chemical property of the developing solution and further ensuring good developing effect.

Description

technical field [0001] The invention relates to a developing device and a developing method thereof, in particular to a device and a method for preventing a developing solution from reacting with gases such as air. Background technique [0002] At present, photolithography is often used in the manufacture of electronic devices, and its main steps include: cleaning, gluing, pre-baking, exposure, development, post-baking, etching, degumming and other processes. Development is to remove the photoresist on the photosensitive part through a developer, and generally use a developer that matches the photoresist. [0003] The existing developing device is generally used for large-scale assembly line production, and the other is small-batch experimental production. Among them, the pipeline such as figure 1 As shown, the developing process includes: transferring the substrate to be developed into the developing tank through the conveying device. Spray the developer, and after the d...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/30H01L51/56
Inventor 邱勇彭兆基陈剑雄张明王鹏吴伟力张绍林
Owner KUNSHAN VISIONOX DISPLAY TECH
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