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Equipment for purifying air-intake for dust-free chamber

A purification equipment and clean room technology, applied in chemical instruments and methods, separation methods, dispersed particle separation, etc., can solve problems such as direct disposal, unsatisfactory removal efficiency, and garbage pollution.

Inactive Publication Date: 2009-03-04
DESICCANT TECH CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

If the semiconductor factory is located in an industrial area surrounded by factories, especially high-tech parks, where the density of factories is very high, the exhaust gas generated by factory A may be inhaled by the air-conditioning intake of factory B, especially the gas pollutants, because it cannot be released Filters such as HEPA or ULPA must be removed by chemical filters or air washers. However, chemical filters or air washers are not suitable for some gas pollutants, such as DMSO, The removal efficiency of low-concentration molecules such as DMS or IPA is not ideal, especially after the chemical filter has been used for a period of time, it must be replaced with a new filter. The saturated filter cannot be regenerated and reused, so it can only be discarded directly. Another kind of garbage pollution

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  • Equipment for purifying air-intake for dust-free chamber
  • Equipment for purifying air-intake for dust-free chamber
  • Equipment for purifying air-intake for dust-free chamber

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Embodiment Construction

[0050] Other features and specific embodiments of the present invention can be further understood in conjunction with the accompanying drawings and the following detailed description.

[0051]Please refer to Figs. 1-3, the present invention is to connect the entrance of the external air inlet 10 with a micro-pollution purification equipment 20, the outlet of the micro-pollution purification equipment 20 is connected with the entrance of an external air conditioning box 30, and the external air conditioner The outlet of the box 30 is connected with the inlet of the clean room 40, and the air outlet of the clean room 40 is directly discharged into the atmosphere, wherein the micro-pollution purification equipment 20 is provided with at least one adsorption mechanism, and the adsorption mechanism is coated with There is an adsorption layer, and the adsorption mechanism is a honeycomb structure. The adsorption mechanism is made of inorganic materials, wherein the inorganic material...

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Abstract

The invention discloses an air inlet purifying equipment of a dust free room and mainly comprises a micro contamination purifying equipment (Airborne Molecular Contamination, AMC) connected at the air inlet. At least an absorbing mechanism is arranged in the contamination purifying equipment, wherein an absorbing layer is besmeared on the absorbing mechanism to absorb micro contamination in the outside air; and an outer air condition case (Make Up Air Unit, MAU) is connected to the back of the micro contamination purifying equipment and the outlet of the air condition case directly leads to the dust free room, and therefore, exterior compensation air can be provided for the dust free room, which has a high requirement of the compensation air quality, to use.

Description

technical field [0001] The invention relates to a clean room intake purification device for effectively removing micro-pollutants in the gas of the production environment, which is suitable for clean rooms in electronic manufacturing industries such as clean rooms in IC, TFT, and semiconductor manufacturing industries or similar sites. Background technique [0002] With the continuous progress of semiconductor technology, the diameter of IC process is continuously shrinking. The latest semiconductor technology has entered 45nm, and it will further enter 22 and 32nm process technology in the future. Due to the continuous reduction of IC wire diameter, the external air Contains micro-pollution (Airborne Molecular Contamination, AMC) substances, such as sulfur-containing substances: SO X 、H 2 S, DMSO (DimethylSulfoxide, (CH 3 ) 2 SO), DMS (Dimethyl Sulfide, (CH 3 ) 2 SO), etc., nitrogen-containing substances: NOX, NH3, MEA (Monoethanol Amine, NH 2 C 2 h 4 OH), etc., con...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61L9/16B01D46/00
Inventor 郑石治林哲弘陈寿忠徐瑞珠刘邦昱洪守铭
Owner DESICCANT TECH CORP