Substrate treatment device, coating device and coating method
A substrate processing device and substrate technology, which is applied to the surface coating liquid device, coating, transportation and packaging, etc., can solve the problems of coating spot, resist coating film thickness change, etc., and achieve mechanism improvement , Improve the coating quality and shorten the takt time of production
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[0080] Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.
[0081] FIG. 1 shows a coating development processing system as an example of the configuration of a substrate processing apparatus, a coating apparatus, and a coating method to which the present invention can be applied. The coating and developing processing system 10 is set in a clean room, for example, a rectangular glass substrate is used as the substrate G to be processed, and cleaning, resist coating, prebaking, developing and processing in the photolithography process are performed in the LCD manufacturing process. A series of treatments such as post-baking. Exposure processing is carried out by an external exposure device 12 provided adjacent to the system.
[0082] The coating and development processing system 10 is equipped with a horizontally long processing station (P / S) 16 at the center, and a cassette station (C / S) 14 and an interface at both end...
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