Ultrathin pre-plating layer lead frame and preparation method thereof
A lead frame and pre-plating technology, used in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve problems such as solder joint embrittlement, hidden reliability concerns, and cost increase, and achieve reduced thickness and low diffusion rate. , increase antioxidant effect
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Embodiment 1
[0039] Such as figure 1 Shown ultra-thin pre-plating lead frame is embodiment one of the present invention, and it comprises copper alloy lead frame substrate 1, on this substrate, tin (Sn) metal layer 2, nickel (Ni) metal layer 3, palladium ( Pd) metal layer 4 and gold (Au) metal layer 5 .
[0040] In this embodiment, the thickness of the Sn metal layer is 3 nm, the thickness of the Ni metal layer is 250 nm, the thickness of the nanoscale Pd metal layer is 10 nm, and the thickness of the nanoscale Au metal layer is 2 nm.
[0041] In practical applications, the thickness of the Sn metal layer can be selected arbitrarily in the range of 1-10nm, the thickness of the Ni metal layer can be selected in the range of 50-350nm, and the thickness of the Pd metal layer can be selected in the range of 5-15nm. Selection; the thickness of the Au metal layer can be properly selected within the range of 1-10 nm.
Embodiment 2
[0043] Such as figure 2 The ultra-thin pre-plating lead frame shown is embodiment two of the present invention, and it comprises copper alloy lead frame substrate 1, on this substrate, first nickel (Ni) metal layer 6, tin (Sn) metal layer 2, tin (Sn) metal layer 2, A second nickel (Ni) metal layer 3 , a palladium (Pd) metal layer 4 and a gold (Au) metal layer 5 .
[0044]In this embodiment, the thickness of the first Ni metal layer 6 is 50nm, the thickness of the Sn metal layer is 3nm, the thickness of the second Ni metal layer 3 is 200nm, the thickness of the Pd metal layer is 10nm, and the thickness of the Au metal layer is 2nm .
[0045] In practical application, the thickness of the first Ni metal layer 6 can be selected arbitrarily in the range of 0-200nm, the thickness of the second Ni metal layer can be selected in a suitable value in the range of 50-350nm; the thickness of the Sn metal layer can be in the range of 1 The thickness of the Pd metal layer can be selecte...
Embodiment 3
[0047] Embodiment 3 of the present invention is a method for preparing a lead frame by high-frequency pulse electrodeposition to prepare the pre-coating structure described in Embodiments 1 and 2, specifically comprising:
[0048] 1) Activate the copper alloy lead frame substrate: first soak the lead frame in 8%-20% sulfuric acid solution for 10-30s, then rinse with deionized water; then immerse the lead frame in 8%-20% sulfuric acid solution In the hydrochloric acid solution, the soaking time is 10-30s, then washed with deionized water and then dried for electrodeposition treatment.
[0049] 2) Sn metal layer electroplating solution and electroplating process: the working frequency of the high-frequency pulse electricity used is 200Hz-500Hz, and the current density is 0.1-2A / dm 2 , the duty ratio used is 30%-60%; the plating solution used is composed of stannous methanesulfonate 10-40g / L, stannous sulfate 20-40g / L, cresolsulfonic acid 30-50g / L, sulfuric acid 10~20g / L, 0.1~0....
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