Chemical-copper plating liquid and copper plating production process
A copper plating solution and chemical technology, which is applied in the field of copper plating production process and chemical-electroplating copper solution, can solve the problems of poor solution stability, high production cost, and difficult separation of metal ions, etc., and achieve strong bonding force and impurity resistance of the plating layer Strong, effective control of harmful impurities
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Embodiment 1
[0045] According to the loading capacity is 1dm 2 / kg to calculate the tubular iron and steel workpieces that need to be copper-plated, then grind, polish, degrease and derust the tubular iron and steel copper-plated workpieces, wash them with water, and then electrolytically degrease and wash them to complete the pretreatment of the tubular steel copper-plated workpieces, and take copper sulfate 50kg, 40kg of sulfuric acid, 20kg of potassium sodium tartrate, 5kg of sodium hypophosphite, 3kg of nickel chloride, and 882kg of deionized water are used to make chemical-electroplating copper solution 1000kg, add it to the plating tank, and put the pretreated tubular steel copper-plated workpiece into the plating tank. Chemical-electroplating copper in the tank, the conditions are: the anode is a phosphorus-containing copper plate of 3‰, the area ratio of the anode and the cathode is 2:1, and the cathode current density is 0.5A / dm 2 , the temperature of the copper plating solution i...
Embodiment 2
[0048] The pretreatment of tubular iron and steel copper-plated workpieces is the same as in Example 1, and the loading capacity is 2.0dm 2 / kg, take copper sulfate 10kg, hydrochloric acid 5kg, nitrilotri-20kg and hydrazine sulfate 3kg, make chemical-electroplating copper solution 1000kg with deionized water 962kg and add in the plating tank, put the tubular steel copper-plated workpiece after pretreatment into the plating Chemical-electroplating copper in the tank, the conditions are: the anode is a phosphorus-containing copper plate of 3‰, the area ratio of the anode and the cathode is 2:1, and the cathode current density is 1A / dm 2 , use sulfuric acid to adjust the PH value to 1.0, the temperature of the copper plating solution is room temperature, the copper plating time is 8 minutes, the deposition rate of the coating is 0.5um / min, the cathode moves, the air is stirred, and the circulation is filtered. The chemical-electroplated copper of the workpiece is completed, and th...
Embodiment 3
[0051] The steel tubular copper-plated workpiece pretreatment is the same as embodiment 1, and the loading capacity is 3.0dm 2 / kg, take 150kg of copper sulfate, 20kg of phosphoric acid, 15kg of sodium citrate and 100kg of glucose and make it with 715kg of deionized water. After adding 1000kg of chemical-electroplating solution into the plating tank, put the pretreated tubular steel copper-plated workpiece into the plating tank for Chemical-electroplating copper, the conditions are: the anode is 3‰ phosphorus-containing copper plate, the area ratio of anode and cathode is 2:1, and the cathode current density is 1.5A / dm 2 , use sulfuric acid to adjust the PH value to 1.5, the temperature of the copper plating solution is room temperature, the copper plating time is 9 minutes, the deposition rate of the coating is 0.4um / min, the cathode moves, the air is stirred, and the circulation is filtered, and the chemical-electroplated copper of the workpiece is completed, and the obtained...
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