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Method for preparing transparent light mask

A photomask and transparent technology, applied in the field of exposure, can solve the problems of increasing the production cost of transparent photomasks, affecting the exposure quality, etc., and achieve the effect of simplifying the alignment and exposure process and saving costs

Inactive Publication Date: 2012-06-13
AVARY HLDG (SHENZHEN) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The preparation method of the above-mentioned transparent photomask not only increases the production cost of the transparent photomask, but also may affect the exposure quality due to the opening of multiple positioning grooves

Method used

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  • Method for preparing transparent light mask
  • Method for preparing transparent light mask
  • Method for preparing transparent light mask

Examples

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Embodiment Construction

[0014] The preparation method of the transparent photomask provided by the embodiment of the technical solution will be further described in detail below with reference to the drawings and examples.

[0015] Please also refer to Figure 1 to Figure 4 , the preparation method of the transparent photomask provided by the embodiment of the technical solution, which includes the following steps:

[0016] In the first step, a transparent substrate 10 , a reference plate 20 and a patterned photomask 30 are provided.

[0017] see figure 1 , the transparent substrate 10 can be made of glass, resin or other transparent materials, and has a first surface 11 and a second surface 12 opposite to each other. The transparent substrate 10 may have a built-in vacuum adsorption device for adsorbing and fixing the patterned photomask 30 on the transparent substrate 10 , or may be a substrate provided with positioning grooves in the prior art. In this embodiment, the transparent substrate 10 i...

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Abstract

The invention provides a method for preparing a transparent light mask, which comprises the following steps: firstly, providing a transparent basal plate comprising a first surface and a second surface; secondly, attaching a reference plate to the first surface and covering the first surface completely, wherein a positioning basic point is arranged on the reference plate; and taking the positioning basic point on the reference plate as a reference and attaching a layer of figure light mask to the second surface. The method for preparing the transparent light mask has simple contraposition andcan save cost.

Description

technical field [0001] The invention relates to the field of exposure technology, in particular to a method for preparing a transparent photomask with simple alignment. Background technique [0002] The production of the conductive circuit of the printed circuit board is to transfer the circuit image preset on the photomask to the photosensitive material such as the dry film on the substrate through the exposure and development process, and then form the required circuit on the substrate through the etching process. line. See Literature, Moon-Youn Jung, Won Ick Jang, Chang Auck Choi, Myung Rae Lee, Chi Hoon Jun, Youn Tae Kim; Novel lithography process for extreme deep trench by using laminated negative dry film resist; 2004: 685-688; 2004.17thIEEE International Conference on Micro Electro Mechanical Systems. [0003] The exposure process is generally carried out in an exposure machine, in which a transparent photomask installed on the exposure machine provides the required...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/00G03F1/76
Inventor 陈黄伟李文钦
Owner AVARY HLDG (SHENZHEN) CO LTD
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