Photonic crystal micro-cavity structure and manufacturing method thereof
A photonic crystal microcavity and photonic crystal technology, applied in the field of optoelectronics, can solve problems such as difficult control and complicated preparation process
Inactive Publication Date: 2011-08-24
PEKING UNIV
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Problems solved by technology
[0007] The purpose of the present invention is to overcome the disadvantages of complex preparation process and difficult regulation of high-Q photonic crystal microcavities in the prior art, and provide a photonic crystal microcavity structure and a manufacturing method thereof. Cavity and substrate, in which the organic cover layer is a highly nonlinear organic conjugated polymer material
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Embodiment 1
[0090] Embodiment 1 Organic-inorganic photonic crystal microcavity composite structure
[0091] On a quartz substrate with a thickness of 300 μm and a length and width of 2 cm, a silicon film with a thickness of 250 nm was grown by chemical vapor deposition (or molecular beam epitaxy); and a focused ion beam etching technology (or molecular beam epitaxy) commonly used in the microelectronics industry was used to Other photolithography techniques) etched square lattice periodic air holes on the silicon film, the lattice constant is 327nm, and the diameter of the air holes is 136nm; there is no etching at the position where there are three adjacent air holes in the middle of the photonic crystal, In this way, a photonic crystal microcavity is constructed; finally, a 100nm-thick MEH-PPV film (as an organic covering layer) is prepared on the semiconductor layer by using the commonly used spin-coating technique in chemistry. Due to the surface tension of the liquid, MEH-PPV will no...
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Abstract
The invention discloses a photonic crystal micro-cavity structure and a manufacturing method thereof, which belongs to the technical field of photoelectron. The photonic crystal micro-cavity structure comprises an organic coating, a substrate and a semiconductor photonic crystal micro-cavity positioned between the organic coating and the substrate, wherein the organic coating is a non-linear organic conjugated polymer. The method comprises: 1) growing a semiconductor thin film on the substrate; 2) etching the photonic crystal micro-cavity structure on the semiconductor thin film; and 3) preparing the organic coating on the photonic crystal micro-cavity structure, wherein the organic coating is the non-linear organic conjugated polymer. Compared with the prior art, optical switches prepared through the photonic crystal micro-cavity have the characteristics of high Q value, low pump power, low power, fast switching time response, and processing and preparation convenience and help to integration.
Description
technical field [0001] The invention relates to a photonic crystal microcavity structure and a manufacturing method thereof, which can realize a photonic crystal all-optical switch with low pumping power in the optical communication band, and belongs to the field of optoelectronic technology. Background technique [0002] Photonic crystal is a new type of artificially designed photonic material formed by two or more materials with different dielectric functions arranged periodically in space. Due to the modulation effect of the spatially periodic dielectric function on the incident light wave, the photonic crystal has a conduction band and a photonic band gap, and has a unique characteristic of controlling the state of photon transmission. It has great potential in the fields of optical communication, optical computing, and ultra-fast information processing. very important application. [0003] The all-optical switch controls the transmission state of another beam of light ...
Claims
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IPC IPC(8): G02F1/35
Inventor 富聿岚胡小永龚旗煌
Owner PEKING UNIV