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Film composing method and method for manufacturing liquid crystal display device

A technology of liquid crystal display device and thin film transistor, which is applied in the photolithographic process of patterned surface, semiconductor/solid-state device manufacturing, instruments, etc., and can solve the problem of areas where only the second thin film cannot be formed, and where the first thin film and the second thin film cannot be formed. Second, the area where the thin film is removed, etc.

Active Publication Date: 2010-06-02
K TRONICS (SUZHOU) TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Among them, the thin film patterning method using a double-tone mask cannot form a region with only the second thin film
[0009] Among them, the film patterning method using the lift-off process cannot form a region where the first film and the second film overlap, and cannot form a region where the first film and the second film are removed

Method used

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  • Film composing method and method for manufacturing liquid crystal display device
  • Film composing method and method for manufacturing liquid crystal display device
  • Film composing method and method for manufacturing liquid crystal display device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0089] figure 1 It is a schematic flowchart of the thin film patterning method according to the first embodiment of the present invention. Such as figure 1 Said, the film patterning method comprises:

[0090] Step 101 , depositing a first thin film on a clean substrate, and coating a photoresist on the substrate deposited with the first thin film.

[0091] Step 102 , exposing the photoresist by using a dual tone mask, and then developing the photoresist. According to the thickness of the photoresist, the surface of the substrate is divided into three regions, which are: the first region, the second region and the third region. Wherein, the first area corresponds to the non-transmission area of ​​the dual-tone mask; the second area corresponds to the semi-transmissive area of ​​the dual-tone mask; and the third area corresponds to the transmission area of ​​the dual-tone mask.

[0092] Figure 2a It is a schematic cross-sectional view of the substrate after step 102 in the...

Embodiment 2

[0106] The manufacturing method of the liquid crystal display device of the second embodiment of the present invention utilizes the film patterning method of the first embodiment of the present invention, and the manufacturing method of the liquid crystal display device includes: the steps of forming gate lines and common electrodes, forming data lines and thin film transistors and the step of forming a pixel electrode.

[0107] Wherein, the step of forming the gate line and the common electrode includes:

[0108] Step 201 , depositing a common electrode transparent conductive layer on a clean and transparent substrate, and then uniformly coating photoresist on the surface of the substrate on which the common electrode transparent conductive layer is deposited, so that the photoresist covers the entire transparent conductive layer.

[0109] Step 202, using a dual-tone mask to expose and develop the photoresist on the surface of the substrate. According to the transmittance, t...

Embodiment 3

[0136] The manufacturing method of the liquid crystal display device of the third embodiment of the present invention utilizes the film patterning method of the first embodiment of the present invention, and the manufacturing method of the liquid crystal display device includes: a step of forming a gate line, a step of forming a data line and a pixel electrode, and Steps of forming thin film transistors.

[0137] Wherein, the step of forming the gate line includes:

[0138] Step 301 , depositing a gate metal layer on a clean and transparent substrate, uniformly coating a photoresist, and exposing and developing the photoresist by using a full tone mask. At this time, only the photoresist remains in the gate line area. Then, the exposed gate metal layer is etched to form gate lines. Finally, the residual photoresist is removed.

[0139] Figure 4a It is a schematic diagram of the substrate after step 301 in the third embodiment of the present invention. Such as Figure 4a...

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PUM

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Abstract

The invention relates to a film composing method and a method for manufacturing a liquid crystal display device. The film composing method comprises the steps of: 1, disposing a first film on a substrate, coating photoresist; 2, forming a first zone, a second zone and a third zone after exposing and developing the photoresist by adopting a double-tone mask; 3, etching the first film, removing the first film in the third zone, forming an etching zone at the periphery of the first zone; 4, graying the photoresist to expose the first film in the second zone; 5, deposing a second film, contacting the first film with the second film in the second zone; and 6, stripping the photoresist, removing the second film in the first region, and exposing the substrate at the etching zone of the first zone. The double-tone mask is adopted in the film composing method, and therefore, a zone with overlaid films and a zone with removed films are formed by a stripping process and an etching process.

Description

technical field [0001] The present invention relates to a film patterning method and a method for manufacturing a liquid crystal display device, in particular to a film patterning method for forming a composite layer structure with two different patterns with a mask and a method for manufacturing a liquid crystal display device using the film patterning method. Background technique [0002] Microelectronics technology is a new technology developed along with integrated circuits, especially VLSIs. Microelectronics technology includes a series of specialized technologies such as system circuit design, thin film patterning method, material preparation, automatic testing, packaging and assembly. With the development of microelectronics technology, its application field has gradually expanded to the manufacturing process of other precision equipment, such as liquid crystal display devices. [0003] Generally speaking, in microelectronics technology, thin films are formed by sput...

Claims

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Application Information

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IPC IPC(8): G03F7/00H01L21/00H01L21/84
CPCH01L27/1214H01L27/1288H01L21/0272
Inventor 闵泰烨林壮奎宋省勳高雪松
Owner K TRONICS (SUZHOU) TECH CO LTD