Method for manufacturing word-line-sharing noncontact split-grid flash memory
A split-gate flash memory and manufacturing method technology, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve the problem of device programming voltage reduction, and achieve the effect of device size reduction, small size, and reduced area
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[0035] In order to better understand the technical content of the present invention, specific embodiments are given together with the attached drawings for description as follows.
[0036] The present invention proposes a non-contact split-gate flash memory manufacturing method for sharing word lines. The obtained flash memory device can effectively reduce the area of the chip while keeping the electrical isolation performance of the chip unchanged, and at the same time avoid excessive The problem of erasing.
[0037] The present invention proposes a method for manufacturing a non-contact split-gate flash memory sharing a word line, which includes the following steps:
[0038] Please refer to figure 1 , the present invention provides a semiconductor substrate 100, and sequentially deposits a first oxide layer 110, a floating gate polysilicon layer 120, a second oxide layer 130, a control gate polysilicon layer 140 and a silicon nitride layer 150; wherein, the first oxide ...
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