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Film deposition apparatus and film deposition method

A technology of film deposition and moving direction, applied in the directions of plasma, vacuum evaporation plating, coating, etc., can solve the problems of damage to the magnetic head, reducing the durability and corrosion resistance of magnetic recording media and magnetic recording devices

Active Publication Date: 2014-04-23
FUJITSU LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

During the formation of the protective film, if the particles are attached to the surface of the magnetic recording medium, the magnetic head may come into contact with carbon particles, thereby damaging the magnetic head
In addition, the separation of carbon particles from the magnetic recording medium may generate hollows on the magnetic recording medium, thereby reducing the durability and corrosion resistance of the magnetic recording medium and the magnetic recording device.

Method used

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  • Film deposition apparatus and film deposition method
  • Film deposition apparatus and film deposition method
  • Film deposition apparatus and film deposition method

Examples

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Embodiment Construction

[0030] figure 1 An exemplary film deposition apparatus is shown. figure 1 The illustrated film deposition apparatus includes a plasma generation section 10 , a magnetic field filter section 20 and a film deposition chamber 30 . The casings of the plasma generating section 10, the magnetic field filtering section 20, and the film deposition chamber 30 may all be mainly formed of metal such as stainless steel. The magnetic field filter 20 can be divided into a plasma separation unit 40 , a particle trapping unit 50 , and a plasma transfer unit 60 .

[0031] The plasma generation part 10, the plasma separation unit 40, and the particle trapping unit 50 may be cylindrical. The plasma generation part 10, the plasma separation unit 40, and the particle trapping unit 50 are arranged in order from bottom to top, and are coupled in a row.

[0032] The plasma transfer unit 60 may be cylindrical. The plasma transfer unit 60 is generally vertically coupled to the plasma separation uni...

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Abstract

A film deposition apparatus includes: a plasma generating section configured to generate plasma between a cathode target and an anode; a film deposition chamber in which a base material is placed; and a magnetic-field filter section configured to remove a particle from the plasma by a magnetic field and to transfer the plasma to the film deposition chamber. The magnetic-field filter section includes: a first housing area to which a first voltage is applied; and a second housing area, provided downstream of the first housing area in the moving direction of the plasma, to which a second voltage is applied.

Description

[0001] Related Application Cross Reference [0002] This application is based on Japanese Patent Application No. 2009-139071 with a filing date of June 10, 2009 and Japanese Patent Application No. 2009-247482 with a filing date of October 28, 2009 and claims the priority of the above applications, hereby The entire content of the above application is incorporated into this application by reference. technical field [0003] Embodiments discussed herein relate to a film deposition apparatus and a film deposition method. Background technique [0004] Magnetic recording devices (hard disk drives) are used, for example, in information devices such as computers and hard disk video recorders. [0005] A magnetic recording device records data by magnetizing a magnetic disk rotating at a high speed, such as a recording layer of a disk-shaped magnetic recording medium having a recording element such as a write head. Data recorded on a magnetic recording medium is read out by a repro...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H05H1/50C23C14/00
CPCH05H1/50C23C14/564C23C14/325C23C14/0605H01J37/32357H01J37/32055C23C16/50
Inventor 中村哲一宫原昭一千叶洋
Owner FUJITSU LTD