Touch screen and display device

Abstract

The invention relates to a touch screen and a display device using the same. The touch screen comprises a first electrode plate and a second electrode plate, wherein the first electrode plate comprises a first matrix and two first electrodes; the second electrode plate comprises a second matrix and two second electrodes; the first electrode plate further comprises a plurality of first carbon nano pipe structures arranged on the surface of the first matrix at intervals, two ends of each first carbon nano pipe structure are respectively electrically connected with the two first electrodes; the second electrode plate further comprises a plurality of second carbon nano pipe structures arranged on the surface of the second matrix at intervals, two ends of each second carbon nano pipe structure are respectively electrically connected with the two second electrode, and the second carbon nano pipe structures are arranged opposite to the first carbon nano pipe structures.

Description

technical field [0001] The invention relates to a touch screen and a display device using the touch screen. Background technique [0002] In recent years, along with the high performance and diversification of various electronic devices such as mobile phones and touch navigation systems, there has been an increase in the number of electronic devices in which light-transmitting touch panels are mounted on the front of display elements such as liquid crystals. Users of such electronic devices operate by pressing the touch panel with fingers or a pen while visually confirming the display content of the display element located on the back of the touch panel through the touch panel. Thereby, various functions of the electronic device can be operated. [0003] According to different working principles and transmission media of touch screens, existing touch screens are usually divided into four types, namely resistive, capacitive sensing, infrared and surface acoustic wave. Among...

AI Technical Summary

Problems solved by technology

[0005] However, as a transparent conductive layer, the ITO layer is usually prepared by ion beam sputtering or evaporation. During the preparation process, a high vacuum environment and heating to 200-300°C are required. Therefore, the preparation cost of the ITO layer is relatively high. high

In addition, after the ITO layer is continuously bent, the resistance at the bend increases, and as a transparent conductive layer, it has the disadvantage of not having good mechanical and chemical durability.

Images