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Light beam stabilizing device in projection mask aligner

A beam stabilization and projecting light technology, which is applied in microlithography exposure equipment, photoplate making process exposure equipment, optics, etc., can solve the problems of beam stability error, laser beam transmission direction and position drift, etc., and achieve smooth micro-adjustment , Improving the quality of imaging and lithography, and the overall rigidity is good

Inactive Publication Date: 2012-04-18
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0002] In the projection lithography machine, before the laser beam enters the illumination system, the beam will drift in the transmission direction and position due to the instability of the laser itself, the vibration of the ground, and the vibration of the gas in the beam transmission path. In the projection lithography machine, the error problem caused by the stability of the beam has not been well solved

Method used

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  • Light beam stabilizing device in projection mask aligner
  • Light beam stabilizing device in projection mask aligner
  • Light beam stabilizing device in projection mask aligner

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Embodiment Construction

[0013] like figure 1 As shown, the embodiment of the present invention is composed of reflector L1, reflector L2, beam splitter L3, beam splitter L4, flexible hinge table 5, flexible hinge table 6, light intensity detector 2, light intensity detector 3 and computer 7. The laser beam emitted by the laser 1 is reflected by the reflector L1 and then reaches the reflector L2, and the beam is reflected by the reflector L2 and then reaches the illumination system 4 of the projection lithography machine through the beam splitter L3. The beam splitter L3 separates a small part of the laser beam to the beam splitter L4, and the beam splitter L4 splits the beam to the light intensity detector 2 and the light intensity detector 3. The light intensity detector 2 detects the deviation between the incident position of the light beam and the optical axis, and the light intensity detector 3 detects the deviation between the incident angle of the light beam and the optical axis. The reflector...

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Abstract

The invention relates to a light beam stabilizing device in a projection mask aligner, which can be used for correcting the direction and position drifting of a light beam of a laser source in the projection mask aligner caused by foundation vibration, gas jitter in transmission path, ambient temperature change, humidity change, air pressure change and the like, thus guaranteeing the imaging and the photoetching quality of a photolithographic system.

Description

technical field [0001] The invention relates to a light beam stabilizing device in a projection lithography machine. technical background [0002] In the projection lithography machine, before the laser beam enters the illumination system, the beam will drift in the transmission direction and position due to the instability of the laser itself, the vibration of the ground, and the vibration of the gas in the beam transmission path. In the projection lithography machine, the error problem caused by the stability of the beam has not been well solved. Contents of the invention [0003] The technical problem of the present invention is: to overcome the deficiencies of the prior art, to provide a beam stabilization device in the projection lithography machine, which can stabilize the laser light source in the projection lithography machine due to foundation vibration, gas vibration in the transmission path, environment Correct the drift of the beam in direction and position ca...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B26/08G03F7/20
Inventor 徐文祥邢薇罗正全马平王建
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI