Method for protecting chip in chip thinning process
A chip and process technology, applied in the field of chip protection, can solve problems such as affecting product quality and production efficiency, troublesome removal of mucous membranes, and easy to tear the film. Effect
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Embodiment 1
[0028] The product silicon chip selected in this embodiment is a gold-backed transistor chip, and the protective film is a 319Y type thermal peeling film produced by Nitto Denko Co., Ltd. The following process steps are used:
[0029] 1. The operator wears clean white gauze gloves, and uses Teflon tweezers to carefully pick up the transistor back gold chip to be filmed from the frame (or from other places where the transistor back gold chip is placed), with the front (tube core product) facing upward Place on vacuum cups.
[0030] 2. Turn on the vacuum, set the pressure of the vacuum suction cup at 0.4Mpa-2.0Mpa, make the transistor back gold silicon wafer to be filmed adsorb on the suction cup, pull the 319Y type thermal peeling film from the roll film to protect the silicon wafer covering the entire product On the front side (die product), use a sponge to initially compact the heat-peeling film and the surface of the product silicon wafer, and then use a blade to cut off th...
Embodiment 2
[0035] The product silicon chip selected in this embodiment is a gold-backed integrated circuit chip, and the protective film is a 3193 type thermal peeling film produced by Nitto Denko Co., Ltd. The following process steps are used:
[0036] 1. The operator wears clean white gauze gloves, and uses Teflon tweezers to carefully pick up the IC back-gold chip to be filmed from the box (or from other places where the IC back-gold chip is placed), and the front (die product) Place upwards on vacuum suction cups.
[0037] 2. Turn on the vacuum, set the pressure of the vacuum suction cup at 0.4Mpa-2.0Mpa, so that the silicon wafer of the product to be laminated is adsorbed on the suction cup, and pull the 3193 type thermal peeling film from the roll film to protect the front of the entire product silicon wafer, use Sponge wipes the thermal release film and the surface of the product silicon wafer for initial compaction, and then uses a blade to cut the heat release film along the ed...
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