Workpiece dividing method
A technology for workpieces and wafers, applied in the field of division processing, can solve the problems of inability to properly cut the bonding film, difficult to bond the film, and forming a modified area alone.
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[0023] figure 1 and figure 2 The wafer W shown is configured such that functional elements D are formed in the area of the surface W1 divided by the planned dividing line L, and an adhesive film 1 is attached to the back surface W2, which is the non-element forming surface of the wafer W, and the wafer W and the adhesive The bonding film 1 forms the workpiece 2 . The surface of the adhesive film 1 attached to the back surface W2 of the wafer W is the surface 1a. The wafer W is formed of, for example, a semiconductor wafer such as a silicon wafer. In addition, as the adhesive film 1, for example, a film called DAF (Die Attach Film) is used.
[0024] The adhesive film 1 side of the workpiece 2 is bonded to the adhesive surface of the expansion tape T. A ring-shaped frame F is attached to the outer peripheral portion of the expansion tape T, and the expansion tape T attached to the ring-shaped frame F is in a state of plugging the opening of the ring frame, and the adhesiv...
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