Two-end gas intake device for phosphorous diffusion furnace tube
A technology of air intake device and phosphorus diffusion, which is applied in the field of diffusion furnace, can solve the problems of poor uniformity of the resistance plate, and achieve the effect of improving the uniformity of square resistance
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[0013] Such as figure 1 As shown, a kind of air inlet device at both ends of the phosphorus diffusion furnace tube includes two air inlet pipes 2 extending in the furnace pipe 1, the two ends of each air inlet pipe 2 are connected to the gas source, and the two ends of each air inlet pipe 2 The same kind of reaction gas is fed in, and the intake ratio at both ends of each intake pipe is adjusted through the valve. There are evenly distributed air outlet holes 3 on the air inlet pipe 2, and the outlet direction of the air outlet holes 3 is parallel to the surface of the silicon wafer 4. The root inlet pipe 2 is fed with different reaction gases respectively to prevent the gases from reacting in advance. The air outlet directions of the air outlet holes 3 on the two air inlet pipes 2 are perpendicular to each other. The extending directions of the two inlet pipes 2 are parallel to the axial direction of the furnace tube 1, and are respectively located in the direction of 15:30 ...
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