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Resist stripper composition

A resist stripping agent and composition technology, applied in the preparation of detergent composition, detergent mixture composition, optics, etc., can solve the problems of component changes, low boiling point of chain amines, etc., to prevent metal corrosion , high penetration effect, and the effect of improving the stripping efficiency

Active Publication Date: 2011-06-22
DONGJIN SEMICHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] However, this chain amine has a low boiling point and has the disadvantage that the composition changes very seriously, and after a perio

Method used

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Examples

Experimental program
Comparison scheme
Effect test

experiment example 1

[0042] The resist stripping effect and metal (aluminum, molybdenum, copper) corrosivity of individual raw materials were evaluated, and the results are shown in Table 1 below.

[0043] That is, in order to select more suitable imidazolidine compound and the ethylene glycol ethyl ether solvent as proton polar solvent, carried out following test, and for carrying out the used test piece of described test as follows:

[0044] Test piece 1: In order to evaluate the corrosiveness of the solvent to metal, the test piece used is sequentially formed on the glass surface After the aluminum, molybdenum, and copper metal films of different sizes are applied, a resist is applied and developed.

[0045] (Size of test piece 1: 100mmX100mm)

[0046] Test piece 2: In order to evaluate the stripping performance of the resist, the test piece used is to form a chromium film on the glass, then coat the resist and carry out wet etching, and then pass into n+a-Si of dry etching gas: H active fil...

Embodiment 1 to 4 and comparative example 1 to 2

[0060] In order to evaluate the stripping performance of the resist and the corrosivity to various metal wirings, a resist stripper composition was prepared from the components and contents in Table 2 below.

[0061] Then, the performance of each resist stripper composition was evaluated using the test piece used in Experimental Example 1, and the results are shown in Table 3. In addition, the above-mentioned evaluation criteria are the same as those of Experimental Example 1 above.

[0062] [Table 2]

[0063]

[0064] In said Table 2, butyldiethylene glycol (butyldiglycol) is diethylene glycol butyl ether (diethyleneglycolbutylether).

[0065] [table 3]

[0066]

[0067] It can be seen from the results in Table 3 that, compared with Comparative Examples 1 and 2, Examples 1 to 4 of the present invention not only have excellent resist stripping performance, but also have excellent anticorrosion effects on metals.

[0068] On the contrary, although the results show that...

Embodiment 5 to 10

[0070] The chain amines or cyclic amines shown in Table 4 below were added to the compositions of Examples 1 to 4 to prepare peeling compositions. Based on 100 parts by weight of the compositions of Examples 1 to 4, the added content of the chain amine or cyclic amine is shown in Table 4 below.

[0071] [Table 4]

[0072]

[0073] In Table 4, MEA is monoethanolamine, AEE is 2-(2-aminoethoxy), and HEP is 1-(2-hydroxyethyl)piperazine.

[0074] The performance of the resist stripper compositions of Examples 5 to 10 was evaluated using the test piece of Experimental Example 1, and the results are shown in Table 5 below.

[0075] [table 5]

[0076]

[0077] As can be seen from the results in Table 5 above, since Examples 5 to 10 of the present invention also added chain amines or cyclic amines to the resist stripper composition, so due to their synergistic effect, Examples 5 to 10 of the present invention have Metal corrosion protection and resist stripping performance are...

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Abstract

The present invention relates to a resist stripper composition, and particularly to a resist stripper composition which comprises imidazolidine compound with a cyclic amine structure thereby obtaining extraordinarily high etching stripping resistance and high corrosion resistance to the metal and minimizing the etching to the metal wiring in a pattern forming process.

Description

technical field [0001] The present invention relates to a resist stripper composition used in a photolithography (photo-lithography) process, and more particularly to a resist stripper composition capable of minimizing corrosion of metal wiring when stripping a resist for forming metal wiring and a resist stripper composition excellent in resist stripping performance. Background technique [0002] Resist (photoresist, photo-resist) is an essential substance in photolithographic printing process, and this photolithographic printing process is generally used in integrated circuit (integrated circuit, IC), large scale integrated circuit (large scale integration) , LSI), semiconductor devices such as very large scale integration (VLSI), liquid crystal display (liquid crystal display, LCD), and image display devices such as flat panel display (plasma display device, PDP) superior. [0003] However, after the photolithography process (photo-lithography processing) is finished, a...

Claims

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Application Information

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IPC IPC(8): G03F7/42
CPCC11D11/0047G03F7/422
Inventor 辛成健金柄郁尹锡壹郑宗铉许舜范郑世桓张斗瑛权五焕朴善周
Owner DONGJIN SEMICHEM CO LTD