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Adjusting mechanism

A technology for adjusting the mechanism and adjusting the structure, applied in the field of photolithography, can solve the problem that the slide table is difficult to meet the requirements, etc., and achieve the effects of low manufacturing cost, simple operation, and easy processing and manufacturing.

Active Publication Date: 2011-06-29
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Here, an adjustment mechanism is needed, which can conveniently realize multi-degree-of-freedom and micro-position adjustment of unit equipment such as reticle library or reticle alignment device, so as to ensure the relative position accuracy requirements between various components. Taiwan is difficult to meet the requirements

Method used

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Embodiment Construction

[0015] In order to make the above and other objects, features and advantages of the present invention more comprehensible, preferred embodiments are described below in detail with accompanying drawings.

[0016] The adjustment mechanism is mainly composed of X-direction structure, Y-direction structure, θ-direction structure, etc., and is based on the rotation of the adjustment element to drive the movement of each axis. The structures in three directions are organically combined without interfering with each other. The entire adjustment mechanism is respectively arranged from bottom to top: base, X-direction structure, θ-direction structure and Y-direction structure. Among them, the X direction and the Y direction are perpendicular to each other, the X direction, the Y direction, and the Z direction are perpendicular to each other, and the θ direction rotates around the Z axis, that is, the Rz direction. Of course, the idea based on this patent can also be transformed into o...

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Abstract

The invention provides an adjusting mechanism. The adjusting mechanism sequentially comprises a foundation, an X-direction structure, a theta-direction structure, and a Y-direction structure from bottom to top; the X-direction structure comprises an X-direction positioning and adjusting module, an X-direction adjusting component, and an X-direction sliding plate; the theta-direction structure comprises a theta-direction positioning adjusting module, a theta-direction adjusting component, and a positioning rod; and the Y-direction structure comprises a Y-direction positioning adjusting module,a Y-direction adjusting component and a Y-direction sliding plate. In the adjusting mechanism, all axes are driven to move based on the rotation of the adjusting components. The structures of the three directions are organically combined and are not interfered with one another. The mechanism is easy to manufacture and is simple and reliable in assembly and the manufacturing cost is low. The horizontality of the adjusting mechanism can be adjusted, the X-direction, Y-direction and theta-direction position adjustment on the horizontal plane can be realized, and the mechanism is easy to operate.The requirements on the horizontality, positioning accuracy and the like of an installation plane can be reduced, and the six-freedom-degree position adjustment can be performed according to actual requirements in the process of integration and debugging of a system.

Description

technical field [0001] The present invention relates to the technical field of photolithography, and in particular to an adjustment mechanism of a reticle alignment device. Background technique [0002] Most of the traditional sliding tables are single-axis, or superimposed two-dimensional or three-dimensional mechanisms, which are difficult to meet the needs of multi-axis adjustment, occupy a large space, and are difficult to place in compact lithography equipment. The sliding table with small stroke, high precision and thin shape is more expensive, and the interface size of the purchased sliding table often cannot match the actual needs, while the self-made sliding table is often bulky and difficult to guarantee the accuracy. [0003] In lithography equipment, unit equipment such as reticle library and reticle alignment device have high requirements for positioning accuracy. However, in the process of modular design of the entire equipment, it is difficult to ensure the ab...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F9/00G03F7/20
Inventor 马佳马喜宝
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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