Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Integral double-frequency laser interferometer

A dual-frequency laser interference and integrated technology, applied in optics, instruments, optical components, etc., can solve problems such as poor anti-environmental interference ability, achieve strong anti-environmental interference ability, good industrial site adaptability, and high effective optical efficiency Effect

Active Publication Date: 2011-07-20
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
View PDF3 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the existence of air gaps, its ability to resist environmental interference is generally poor
Therefore, the measurement accuracy of the current interferometer is still far from its theoretical limit.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Integral double-frequency laser interferometer
  • Integral double-frequency laser interferometer
  • Integral double-frequency laser interferometer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0034] In order to better understand the technical content of the present invention, specific embodiments are given together with the attached drawings for description as follows.

[0035] Please refer to image 3 , image 3 Shown is a schematic structural view of the integrated dual-frequency laser interferometer according to the first embodiment of the present invention.

[0036] image 3 The shown integrated dual-frequency laser interferometer structure mainly includes a main polarization beam splitter 100 , an incident polarization beam splitter 200 , an output polarization beam splitter 300 and a measuring mirror 24 . The incident polarization beam splitter 200 is located on the periphery of the main polarization beam splitter 100 and intersects with the main polarization beam splitter 100 on the first side and the second side of the main polarization beam splitter 100 . The outgoing polarizing beam splitter 300 is located at the periphery of the incident polarizing beam...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides an integral double-frequency laser interferometer which mainly comprises a main polarizing light-splitting body, an incident polarizing light-splitting body, an emergent polarizing light-splitting body, an optical-path compensation plate, a half waveplate, a first pyramidal prism, a quarter waveplate, a second pyramidal prism and a quarter reflected waveplate. In the invention, a reference light path is completely separated from a measuring light path, therefore, theoretically, the nonlinear error caused by the inexhaustive light split of the interferometer is zero; thereference light path is completely equal to the measuring light path, theoretically, the temperature drift of the interferometer is zero, the interferometer is provided with single beam input and single beam output, has high effective optical efficiency, and adapts to the current universal laser interference measuring system; and the interferometer is an integral interferometer, compared with thetraditional separating type interferometer, the interferometer provided by the invention is strong in ambient interference resistance capacity and good in industrial field adaptation capacity.

Description

technical field [0001] The invention relates to high-precision displacement measurement, in particular to an integrated dual-frequency laser interferometer. Background technique [0002] As an ultra-precise non-contact measuring device, the laser interferometer system can perform high-speed and high-precision displacement measurement. If combined with different accessories, it can also measure length, speed, angle, flatness, straightness, etc., with Large measurement range, high resolution, high precision and other advantages. It has a very wide range of applications in semiconductor manufacturing, precision machine tool processing, military, aerospace, automobile manufacturing, coordinate measurement and other fields. However, due to changes in the environment, such as air temperature, pressure, and humidity changes, the optical path changes will also cause large measurement errors, and the inherent defects of the interferometer will also cause nonlinear errors. At presen...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01B9/02G01B11/02G02B27/28
Inventor 肖鹏飞张志平张晓文任胜伟池峰陈勇辉
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products