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Array substrate of active component and production method thereof

A technology of active components and substrates, applied in semiconductor/solid-state device manufacturing, electrical components, electric solid-state devices, etc., can solve the problem that the cost of the display cannot be effectively reduced, and achieve the effect of simple method, reduced use, and reduced burden

Inactive Publication Date: 2013-11-06
CPT TECH GRP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, since the manufacturing cost of the half-tone mask is at least twice that of the traditional mask, the cost of making a transflective or total reflective display cannot be effectively reduced.

Method used

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  • Array substrate of active component and production method thereof
  • Array substrate of active component and production method thereof
  • Array substrate of active component and production method thereof

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Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0048] figure 1 It is a partial cross-sectional view of an active device array substrate according to an embodiment of the present invention. Please refer to figure 1 The active device array substrate 100 of this embodiment includes a substrate 110 , a plurality of active devices 120 , a protection layer 130 , a photoresist material layer 140 , a plurality of particles 150 , a plurality of transparent electrodes 160 and a plurality of reflective electrodes 170 . The substrate 110 defines a plurality of first regions P1 and a plurality of second regions P2. The active device 120 is disposed on the substrate 110 and located in the first regions P1. Each active device 120 has a gate 122 , an active layer 124 , a drain 126 and a source 128 , wherein the active layer 124 is electrically connected to the drain 126 and the source 128 . In this embodiment, the first area P1 is mainly used for disposing the active component 120 , and the second area P2 is mainly used for defining an...

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PUM

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Abstract

The invention relates to an array substrate of an active component and a production method thereof. In the invention, particles are doped in a photoresist; and the particle-doped photoresist is coated on a protective layer through a spin coating method and the like to form a photoresist layer provided with raised patterns on the surface, wherein the diameter of at least part of particles is larger than the thickness of the photoresist layer. Therefore, the forming method of the raised patterns, provided by the invention, is simpler and easier, so that the use of traditional photomasks can be reduced, and therefore the load on the production cost is reduced. In addition, as the raised patterns are formed on the surface of the photoresist layer, and a reflecting electrode is conformally arranged above the raised patterns, so that the array substrate of the active component can be applied on a transflective or total-reflective type liquid crystal display panel.

Description

technical field [0001] The present invention relates to an array substrate and a manufacturing method thereof, and in particular to an active component array substrate and a manufacturing method thereof. Background technique [0002] Generally speaking, the production of transflective or total reflective displays usually uses a seven-step manufacturing process. Among them, transflective or total reflective displays can usually use external light as the backlight for display, so It can save the power consumption of the traditional backlight module, and even reduce the use area of ​​the backlight module, so as to achieve the purpose of reducing the cost. [0003] In addition, in order to increase the utilization rate of reflected light, most of the current technologies will produce a roughened structure on the surface of the reflective area to achieve this purpose. For example, traditionally, half tone mask (HTM Mask) process can be used to complete. However, since the manuf...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/12G03F7/004H01L21/77
Inventor 徐承宇郑耀豊
Owner CPT TECH GRP